光学学报, 1984, 4 (12): 1088, 网络出版: 2011-09-15
离子轰击对蒸发薄膜性质的影响
Effect of ion bombardment on thin film properties
摘要
用一个冷阴极离子枪产生的氧离子轰击淀积过程中的薄膜表面.研究了离子轰击对薄膜聚集密度和潮气吸附的影响.实验表明,经离子轰击的ZrO_2,TiO_2和SiO_2膜,用石英晶体微量天平测得的聚集密度增加到0.9以上;用这些材料制成的干涉滤光片,基于滤光片暴露于潮湿气氛中的潮气吸附,测得峰值透射波长的漂移减小了大约2/3.这说明利用离子辅助技术有可能制备优良光学性能和机械性质的薄膜.
Abstract
Oxygen ions from a cold cathode ion-gun have been used tor bombarding the growing thin films. The effect of ion bombardment on film packing density and moisture adsorption is examined. Experimental results confirm that the packing density of ZrO2, TiO2 and SiO2 with ion bombardment, measured by a quartz crystal microbalance, is increased to over 0.9. Based on the technique of moisture adsorption the measured drift of the peak transmission wavelength of interference filters consisted of these materials is reduced by a factor of B. It shows that ion assisted technique might be employed to produce films of superior optical and mechanical performances.
参考文献
顾培夫, 唐晋发. 离子轰击对蒸发薄膜性质的影响[J]. 光学学报, 1984, 4(12): 1088. GU PEIFU, TANG JINFA. Effect of ion bombardment on thin film properties[J]. Acta Optica Sinica, 1984, 4(12): 1088.