光学学报, 2007, 27 (7): 1151, 网络出版: 2007-08-17
紫外刻划光栅母版及二代版衍射特性的模拟与分析
Analysis and Simulation of Diffraction Characteristics of the Ultraviolet Ruled Grating Master and the Second Duplicate
衍射与光栅 紫外刻划光栅 复制光栅 衍射特性 微分法 diffraction and grating ultraviolet ruled grating replica grating diffraction characteristic differential theory
摘要
运用微分理论对刻线密度为1200 lp/mm的紫外刻划光栅母版及其二代复制版的衍射特性做了模拟,指出了二者之间存在的差异,并与测试结果做了对照。数值模拟表明,紫外刻划光栅二代复制版的衍射特性与其母版略有不同,原因是光栅槽形发生了改变,分别给出了采用多项式拟合槽形函数和傅里叶级数拟合槽形函数的方法。此理论分析方法为澄清光栅复制工艺中的争议完善翻版技术以及寻找提高紫外光栅衍射效率的途径提供了很好的理论参考依据。
Abstract
The diffraction characteristics of 1200 lp/mm ultraviolet ruled grating master and the second duplicate were simulated by differential theory and distinguished. The simulation results mere compared with the tested results. The numerical simulation indicated that the diffraction characteristics of the ultraviolet ruled grating master and the second duplicate are slightly different for the change of grating groove profiles. The methods of grating groove profile polynomial fitting and Fourier series fitting are presented. This theoretical analysis clarified the dispute in the diffraction grating duplication craft, perfected reprint technology and offered practical theoretical reference for improving diffraction grating efficiency.
朱洪春, 巴音贺希格. 紫外刻划光栅母版及二代版衍射特性的模拟与分析[J]. 光学学报, 2007, 27(7): 1151. 朱洪春, 巴音贺希格. Analysis and Simulation of Diffraction Characteristics of the Ultraviolet Ruled Grating Master and the Second Duplicate[J]. Acta Optica Sinica, 2007, 27(7): 1151.