基于同步辐射光刻工艺和电铸工艺的金属纳米光栅模具制备

随着微电子技术的发展，有必要研究在基板上制备高深宽比并拥有垂直侧壁的微纳结构。基于X射线可以制备高质量的纳米母光栅，利用精密纳米电铸技术从母光栅中复制出高质量的微纳金属光栅模具。研究了一种高深宽比的金属镍光栅模具的制备技术。基于同步辐射光刻技术，在硅基板上制备线宽分别为0.25，0.5，1 μm，高2.0 μm的聚甲基丙烯酸甲酯(PMMA)光栅。利用精密电铸技术，得到线宽分别为0.25，0.5，1 μm的金属镍纳米光栅模具，1 μm的金属光栅深宽比达1.5。为了获得高质量的PMMA纳米光栅母模，使用了粘接剂，克服了光栅倒伏的缺陷，优化曝光参数，消除了结构底部出现的多余的小三角形结构。

Abstract

With the development of microelectronics technology, it is necessary to study the fabrication process for high aspect ratio and a vertical sidewalls micro-nanostructures on the substrate. High quality nano master grating can be fabricated by X-rays lithography. By using sophisticated nano electroforming technology, high-quality nano metal grating can be replicated from the mother mold grating. A technique for preparing high aspect ratio diffraction grating metal molds is introduced. Based on synchrotron radiation lithography technique, polymethyl methacrylate (PMMA) nano gratings with line width of 0.25, 0.5, 1 μm, and the height of 2.0 μm are prepared on a silicon substrate. Using precision electroforming technique, nickel nano-grating mold with the line width of 0.25, 0.5, 1 μm, and the 1 μm gratings aspect ratio of 1.5 is fabricated from the PMMA grating master mold. In order to obtain high-quality PMMA nano-grating, the adhesive is used to overcome the deficiencies of structures collapsed, by optimizing exposure parameters, small triangular structures at the bottom of the gratings are eliminated.

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基于同步辐射光刻工艺和电铸工艺的金属纳米光栅模具制备

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