一种改善准分子激光光束均匀性的新型均匀器
[1] Doh Hoon Kim, Byung-Ho Nam, Kag Hyeon Lee et al.. Probe beam scan type auto-focus system using position sensing detector for sub-half micron lithography tools [C]. SPIE, 1996, 2726:876~886
[2] Doh Hoon Kim, Kag Hyeon Lee, Jong Soo Kim et al.. Performance of small field 193 nm exposure system [C]. SPIE, 1997, 3051:922~932
[4] Li Chengde, Chen Tao, Zuo Tiechuan. Design of fly′s eye homogenizer for excimer laser micromachining[J]. Chinese J. Lasers, 1999, A26(6):560~564
李呈德,陈涛,左铁钏. 两级复眼式准分子激光微加工均匀器的设计[J]. 中国激光, 1999, A26(6):560~564
[6] . R. Latta, K. Jain. Beam intensity uniformization by mirror folding[J]. Opt. Commun., 1984, 49(6): 435-439.
[7] . Klauminzer, C. Abele. Excimer lasers need specifications for beam uniformity[J]. Laser Focus World, 1991, 27(5): 153-158.
李红霞, 楼祺洪, 董景星, 叶震寰, 魏运荣, 凌磊. 一种改善准分子激光光束均匀性的新型均匀器[J]. 中国激光, 2004, 31(7): 785. 李红霞, 楼祺洪, 董景星, 叶震寰, 魏运荣, 凌磊. A Novel Homogenizer to Improve the Excimer Laser Beam Uniformity[J]. Chinese Journal of Lasers, 2004, 31(7): 785.