1064 nm和532 nm激光共同辐照薄膜的损伤

建立了两个不同波长激光同时辐照薄膜的损伤阈值测试装置,实验研究和对比1064 nm激光,532 nm激光,1064 nm和532 nm激光共同作用3种不同方式辐照1064 nm和532 nm增透膜(ARF)的损伤阈值及其损伤形貌。结果表明,1064 nm和532 nm激光共同作用损伤形貌和532 nm激光单独作用下的形貌相似,532 nm激光在诱发薄膜损伤因素中起主导作用。1064 nm激光单独辐照薄膜的损伤阈值高于532 nm激光,而1064 nm和532 nm激光共同作用下薄膜的阈值介于这两者之间。

Abstract

A testing device of laser-induced damage threshold (LIDT) with the combined irradiation of different wavelength pulse was built. The damage morphology and the laser-induced damage threshold of 1064 nm and 532 nm anti-reflection film (ARF) were researched by 1064 nm pulse only,532 nm pulse only and 1064 nm with 532 nm pulse combined irradiation. The result showed that the damage morphology of samples caused by 1064 nm and 532 nm pulse combined irradiation was similar with which of the 532 nm pulse,and the 532 nm pulse plays a leading role in the factors that induce damage. The LIDT of 1064 nm pulse is higher than one of 532 nm pulse,that of 1064 nm and 532 nm pulse combined irradiation is in the range between 1064 nm pulse only and 532 nm pulse only.

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周明, 赵元安, 李大伟, 范正修, 邵建达. 1064 nm和532 nm激光共同辐照薄膜的损伤[J]. 中国激光, 2009, 36(11): 3050. Zhou Ming, Zhao Yuan′an, Li Dawei, Fan Zhengxiu, Shao Jianda. Laser Damage of Optical Film with the Combined Irradiation of 1064 nm and 532 nm Pulse[J]. Chinese Journal of Lasers, 2009, 36(11): 3050.

1064 nm和532 nm激光共同辐照薄膜的损伤

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