光学学报, 1988, 8 (8): 742, 网络出版: 2011-09-16
熔石英的快速激光刻蚀
Rapid laser etching of fused SiO2
摘要
使用10.6μm连续波CO_2激光和几种工作气体,对熔石英实现了快速的激光刻蚀.得到了刻蚀速度高于200μm/s的干净、光滑的表面;并根据所提出的机理对观察到的实验结果进行了解释.
Abstract
Rapid laser etching of fused Si02 has been achieved using a 10.6μm CW CO2 laser and several etchant gases. Etch rates of above 200μm/s and clean, smooth surfaces have been obtained. The observed experimental results are explained in terms of the presented mechanizins.
参考文献
潘大任. 熔石英的快速激光刻蚀[J]. 光学学报, 1988, 8(8): 742. PAN DAREN. Rapid laser etching of fused SiO2[J]. Acta Optica Sinica, 1988, 8(8): 742.
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