叙述具有同轴对准特性的光学投影物镜双远心结构和均匀照明光学系统原理。为了满足ｉ线光刻所需的光学传递函数要求，讨论了光刻分辨率和数值孔径的关系。设计了一种新的双远心投影物镜，其数值孔径NA=0.42，放大倍率M=-1/5，像场尺寸15 mm×15 mm(直径21.2 mm)，共轭距L=602 mm。用光学设计程序ZEMAX-XE计算此ｉ线物镜的像质。设计结果说明，整个视场内波差<λ/4，MTF>0.55，当空间频率为715 pair lines/mm，使用波长为365士3 nm时。可以实现0.7 μm光刻分辨率；照明均匀器，由81个小方型透镜组成一方列阵。用本文模拟计算软件OPENG计算被照像平面上的光能分布，说明实际系统的照明不均匀性为土2％。

Double telecentricity configuration of optical projection lenses with alignment characteristic through optical axis and uniform illumination principle of optical system for microlithography are discribed. To meet requirements of optical transfer function (OTF)for i-line lithography, the relations between photolithographic resolution and numerical aperture (NA) are discussed. As an example, we designed a new double telecentricity projection lens with NA=0.42, magnification M=-1/5, field size 15 mm×15 mm (21.2 mm diametre) and conjugate distance 602 mm. Optical design program ZEMAX-XE is used to calculate image qualities of the i-line lens. The calculating results indicate that the wavefront aberration <λ/4 and MTF>0.55 across the entire field when spatial frequency is 715 pl/mm and using wavelength is 365士3 nm. That means the photolithographic resolution of 0.7 μm could be realized. The illumination uniformizer consists of an array of 81 small square lens elements. The illumination uniformity of 士2% could be realized by using our simulation program OPENG to calculated light intensity distribution on illuminated image plane.