B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm

Zhanshan Wang; Shumin Zhang; Wenjuan Wu; Jingtao Zhu; Hongchang Wang; Cunxia Li; Yao Xu; Fengli Wang; Zhong Zhang; Lingyan Chen; Hongjun Zhou; Tonglin Huo

Chinese Optics Letters, 2006, 4 (10): 611, Published Online: Oct. 31, 2006

B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm Download： 682次

Zhanshan Wang ¹Shumin Zhang ¹Wenjuan Wu ¹Jingtao Zhu ¹Hongchang Wang ¹Cunxia Li ¹Yao Xu ¹Fengli Wang ¹Zhong Zhang ¹Lingyan Chen ¹Hongjun Zhou ²Tonglin Huo ²

Author Affiliations

¹ Institute of Precision Optical Engineering, Physics Department, Tongji University, Shanghai 200092

² National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029

Figures & Tables

Zhanshan Wang, Shumin Zhang, Wenjuan Wu, Jingtao Zhu, Hongchang Wang, Cunxia Li, Yao Xu, Fengli Wang, Zhong Zhang, Lingyan Chen, Hongjun Zhou, Tonglin Huo. B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm[J]. Chinese Optics Letters, 2006, 4(10): 611.