光学学报, 1985, 5 (2): 157, 网络出版: 2011-09-16  

光学薄膜非均匀性的实时椭圆偏振测量

In-situ measurement of inhomogeneity for optical thin films by ellipsometry
作者单位
浙江大学光学仪器系
摘要
我们在真空镀膜机上装置了一套旋转检偏器式的自动光度椭圆偏振仪,对蒸发中的薄膜进行实时偏振测量。然后从偏振参数Δ,ψ随厚度变化的轨迹中分析折射率的非均匀性情况。实验结果表明,ZnS和ZnSe都具有近100的内表面过渡层和外表面过渡层,中间则基本是均匀膜层。
Abstract
An automatic photometric ellipsometer with a rotating analyser was constructed on a coating plant for in-situ inhomogeneity measurement of thin film during deposition. The information on inhomogeneity is obtained with the aid of the trace of the elliptical parameters Δ and Ψ versus film thickness. The experimental result suggested that transition layers of lower index may exist on either side of ZnS and ZnSe film while central parts between the transition layers are essentially homogeneous.

吴启宏. 光学薄膜非均匀性的实时椭圆偏振测量[J]. 光学学报, 1985, 5(2): 157. WU QIHOUG. In-situ measurement of inhomogeneity for optical thin films by ellipsometry[J]. Acta Optica Sinica, 1985, 5(2): 157.

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