红外与激光工程, 2004, 33 (1): 76, 网络出版: 2006-05-25
红外焦平面阵列非均匀性的两点校正及依据
Two-point nonuniformity correction for IRFPA and its physical motivation
基本信息
DOI: | -- |
中图分类号: | TP21 |
栏目: | 焦平面阵列 |
项目基金: | -- |
收稿日期: | 2003-05-14 |
修改稿日期: | -- |
网络出版日期: | 2006-05-25 |
通讯作者: | |
备注: | -- |
刘会通, 易新建. 红外焦平面阵列非均匀性的两点校正及依据[J]. 红外与激光工程, 2004, 33(1): 76. 刘会通, 易新建. Two-point nonuniformity correction for IRFPA and its physical motivation[J]. Infrared and Laser Engineering, 2004, 33(1): 76.