红外与激光工程, 2004, 33 (1): 76, 网络出版: 2006-05-25
红外焦平面阵列非均匀性的两点校正及依据
Two-point nonuniformity correction for IRFPA and its physical motivation
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刘会通, 易新建. 红外焦平面阵列非均匀性的两点校正及依据[J]. 红外与激光工程, 2004, 33(1): 76. 刘会通, 易新建. Two-point nonuniformity correction for IRFPA and its physical motivation[J]. Infrared and Laser Engineering, 2004, 33(1): 76.
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