Chinese Optics Letters, 2021, 19 (7): 072201, Published Online: Mar. 22, 2021  

Self-aligned fiber-based dual-beam source for STED nanolithography Download: 812次

Author Affiliations
School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 201800, China
Basic Information
DOI: 10.3788/COL202119.072201
中图分类号: --
栏目: Optical Design and Fabrication
项目基金: This work was supported by the National Natural Science Foundation of China (No. 61805142), the Shanghai Science and Technology Committee (No. 19060502500), and the Natural Science Foundation of Shanghai (No. 20ZR1437600).
收稿日期: Sep. 3, 2020
修改稿日期: --
网络出版日期: Mar. 22, 2021
通讯作者: Qiwen Zhan (qwzhan@usst.edu.cn)
备注: --

Jian Chen, Guoliang Chen, Qiwen Zhan. Self-aligned fiber-based dual-beam source for STED nanolithography[J]. Chinese Optics Letters, 2021, 19(7): 072201.

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