脉冲激光沉积制备Mg<sub>x</sub>Ni<sub>1-x</sub>O 合金薄膜的表征及光学性质研究

孟刚; 王雪敏; 俞健; 王朝阳; 唐永健

doi:doi:10.11884/hplpb201830.180068

强激光与粒子束, 2018, 30 (7): 071003, 网络出版: 2018-08-21

脉冲激光沉积制备Mg_xNi_1-xO 合金薄膜的表征及光学性质研究

Characterization and optical properties investigation of pulsed laser deposited Mg_xNi_1-xO alloy film

论文大纲

孟刚王雪敏俞健王朝阳唐永健

作者单位

中国工程物理研究院激光聚变研究中心, 四川绵阳 621900

脉冲激光沉积合金薄膜光学带隙退火处理 pulsed laser deposition alloy film optical band gap annealing treatment

摘要

应用脉冲激光沉积(PLD)技术，固定脉冲激光能量密度为5 J/cm2，调节薄膜生长基底温度为300~700 ℃，制备了系列MgxNi1-xO合金薄膜。通过透射电子显微镜(TEM)、X射线光电子能谱(XPS)、原子力显微术(AFM)等表征分析手段，详细分析了薄膜的成分及组织，研究了退火处理对样品的影响。通过UV-Vis分光光度计研究了透射光谱，结合理论计算了光学带隙宽度。结果表明：薄膜由非晶及多晶构成，紫外吸收边约为290 nm,接近日盲波段的上限；衬底温度为500 ℃、激光脉冲能量密度为5 J/cm2时生长的薄膜在短波部分吸收强烈，而长波部分几乎不吸收，有利于紫外探测；退火处理改善了样品表面质量，但不能有效拓宽光学带隙。

Abstract

A series of MgxNi1-xO alloy films were prepared by pulsed laser deposition.In the procedure, the laser energy density was fixed at 5 J/cm2, while the temperature of heated substrate varied from 300 ℃ to 700 ℃.The composition and microstructure of the as deposited films were characterized by atomic force microscopy(AFM), transmission electron microscopy(TEM) and X -ray photoelectron spectroscopy(XPS). The influence of annealing on the sample was also studied. UV-VIS spectrophotometer was used to analyse the transmittance of the films. Some interesting results were obtained. The as deposited MgxNi1-xO film was found constituted by crystalline component and amorphous one. The ultraviolet absorption edge were located at about 290 nm, near the superior limit of solar-blind wavelength. It is also found that the film prepared at 5 J/cm2-500 ℃ have strong absorption within short wave range, but scarce absorption in infrared and visible wave band, which is useful to ultraviolet detection.The annealing treatment was very effective to improve the surface quality of the film, but had little effect on the optical band gap.

参考文献

[1] Monroy E, Omnès F, Calle F. Wide-bandgap semiconductor ultraviolet[J]. Semicond Sci Technol, 2003, 18: R33-R51.

[2] Chen Hongyu, Liu Hui, Zhang Zhiming, et al. Nanostructured photodetectors: from ultraviolet to terahertz[J]. Adv Mater, 2016, 28(3): 403-433.

[3] Omnès F, Monroy E, Muoz E, et al. Wide bandgap UV photodetectors: A short review of devices and applications[C]//Proc of SPIE. 2007: 64730E.

[4] Jiang D Y, Shan C X, Zhang J Y, et al. MgxZn1-xO solar-blind photodetector grown by radio frequency magnetron sputtering[J]. Journal of Physics D: Applied Physics, 2009, 42: 025106.

[5] Wang Xu, Saito K, Tanaka T, et al. Lower temperature growth of single phase MgZnO films in all Mg content range[J]. Journal of Alloys and Compounds, 2015, 627: 383-387.

[6] Fan M M, Liu K W, Zhang Z Z, et al. High-performance solar-blind ultraviolet photodetector based on mixed-phase ZnMgO thin film[J]. Applied Physics Letters, 2014, 105: 011117.

[7] Zhao Yanmin, Zhang Jiying, Jiang Dayong, et al. MgNiO-based metal-semiconductor-metal ultraviolet photodetector[J]. Journal of Physics D: Applied Physics, 2009, 42: 092007.

[8] Yang Zhiguo, Zhu Liping, Guo Yanmin, et al. Preparation and band-gap modulation in MgxNi1-xO thin films as a function of Mg contents[J]. Thin Solid Films, 2011, 519(15): 5174-5177.

[9] Guo Yanmin, Zhu Liping, Jiang Jie, et al. Enhanced performance of NiMgO-based ultraviolet photodetector by rapid thermal annealing[J]. Thin Solid Films, 2014, 558: 311-314.

[10] Huang Zhanfeng, Zeng Xianwei, Wang Huan, et al. Enhanced performance of p-type dye sensitized solar cells based on mesoporous Ni1-xMgxO ternary oxide films[J]. RSC Adv, 2014, 4(105): 60670-60674.

[11] Bulgakova N M, Bulgakov A V. Pulsed laser ablation of solids: transition from normal vaporization to phase explosion[J]. Applied Physics A Materials Science & Processing, 2001, 73(2): 199-208.

孟刚, 王雪敏, 俞健, 王朝阳, 唐永健. 脉冲激光沉积制备Mg_xNi_1-xO 合金薄膜的表征及光学性质研究[J]. 强激光与粒子束, 2018, 30(7): 071003. Meng Gang, Wang Xuemin, Yu Jian, Wang Chaoyang, Tang Yongjian. Characterization and optical properties investigation of pulsed laser deposited Mg_xNi_1-xO alloy film[J]. High Power Laser and Particle Beams, 2018, 30(7): 071003.

脉冲激光沉积制备Mg_xNi_1-xO 合金薄膜的表征及光学性质研究

关于本站 Cookie 的使用提示

全站搜索

脉冲激光沉积制备MgxNi1-xO 合金薄膜的表征及光学性质研究

相关论文

相关资讯

关于本站 Cookie 的使用提示

全站搜索

脉冲激光沉积制备Mg_xNi_1-xO 合金薄膜的表征及光学性质研究