Chinese Optics Letters, 2007, 5 (10): 602, Published Online: Oct. 11, 2007
Quantum simulation for peak broadening in atom lithography 
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| DOI: | -- |
| 中图分类号: | -- |
| 栏目: | |
| 项目基金: | -- |
| 收稿日期: | Apr. 23, 2007 |
| 修改稿日期: | -- |
| 网络出版日期: | Oct. 11, 2007 |
| 通讯作者: | Min Zhao (minminzhao@mail.tongji.edu.cn) |
| 备注: | -- |
Min Zhao, Zhanshan Wang, Yan Ma, Bin Ma, Fosheng Li. Quantum simulation for peak broadening in atom lithography[J]. Chinese Optics Letters, 2007, 5(10): 602.
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