Chinese Optics Letters, 2007, 5 (10): 602, Published Online: Oct. 11, 2007
Quantum simulation for peak broadening in atom lithography Download: 566次
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Min Zhao, Zhanshan Wang, Yan Ma, Bin Ma, Fosheng Li. Quantum simulation for peak broadening in atom lithography[J]. Chinese Optics Letters, 2007, 5(10): 602.