表面等离子体共振膜系结构优化设计

洪小刚; 徐文东; 赵成强; 唐晓东

doi:doi:10.3788/aos20103007.2164

光学学报, 2010, 30 (7): 2164, 网络出版: 2010-07-13

表面等离子体共振膜系结构优化设计

Optimal Design of Surface Plasmon Resonance Films Structure

论文大纲

洪小刚 ^1,*徐文东 ¹赵成强 ¹唐晓东 ²

作者单位

¹ 中国科学院上海光学精密机械研究所强激光材料重点实验室,上海 201800

² 华东师范大学信息科学技术学院,上海 200241

摘要

Kretschmann型激发表面等离子体共振(SPR)膜系结构是探针诱导表面等离子体共振耦合纳米光刻技术(PSPRN)的关键部分之一。采用多层介质的特性矩阵法计算膜系结构的透射系数和反射率,对PSPRN所需的单膜层、双膜层及三膜层膜系结构进行了优化设计。计算结果表明,光波波长为514.5 nm时,对于选定材料的最佳膜系结构是Ag膜厚度为46 nm的单膜层结构,Ag膜厚度为24 nm,AgOx厚度为95 nm的双膜层结构及Ag膜厚度为44 nm,SiO2厚度为180 nm,AgOx厚度为10 nm的三膜层结构,提出了记录层材料应选择折射系数小且吸收系数尽可能小的光刻材料的观点。

Abstract

Kretschmann surface plasmon resonance (SPR) films structure is one of the most important parts of probe induced surface plasmon resonance coupling nanolithography (PSPRN). The film characteristic matrix method is used to calculate the transmission coefficient and the reflectivity of the layers for optimal design of single-,two- or three-films structure of PSPRN. Optimal results for the selected film materials are obtained at the wavelength of 514.5 nm. For single film structure,the optimal thickness of Ag film is 46 nm. The optimal thickness of the Ag film is 24 nm and the AgOx film is 95 nm for two-film structure. For three-film structure,the optimal result is that the thickness of Ag film is 44 nm,SiO2 film is 180 nm,and AgOx film is 10 nm. Furthermore,it is presented that the material with small refractive index and low absorption coefficient is more effective as the recording layer.

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洪小刚, 徐文东, 赵成强, 唐晓东. 表面等离子体共振膜系结构优化设计[J]. 光学学报, 2010, 30(7): 2164. Hong Xiaogang, Xu Wendong, Zhao Chengqiang, Tang Xiaodong. Optimal Design of Surface Plasmon Resonance Films Structure[J]. Acta Optica Sinica, 2010, 30(7): 2164.

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