光电子快报(英文版), 2013, 9 (6): 449, Published Online: Oct. 12, 2017  

Morphology of CIGS thin films deposited by single-stage process and three-stage process at low temperature

Author Affiliations
1 Tianjin Key Laboratory of Film Electronic and Communication Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin 300384, China
2 National Key Laboratory of Power Sources, Tianjin Institute of Power Sources, Tianjin 300381, China
Basic Information
DOI: 10.1007/s11801-013-3130-3
中图分类号: --
栏目:
项目基金: This work has been supported by the National High Technology Research and Development Program of China (No.2012AA050701).
收稿日期: Jul. 19, 2013
修改稿日期: --
网络出版日期: Oct. 12, 2017
通讯作者: XUE Yu-ming (orwell.x@163.com)
备注: --

ZHANG Jia-wei, XUE Yu-ming, LI Wei, ZHAO Yan-min, QIAO Zai-xiang. Morphology of CIGS thin films deposited by single-stage process and three-stage process at low temperature[J]. 光电子快报(英文版), 2013, 9(6): 449.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!