[1] 张文杰, 彭玉峰, 王建成, 等. 双离子束溅射沉积HfO2光学薄膜的研究 ［J］. 强激光与粒子束, 2007, 19(9):1543-1546.

    ZHANG W J, PENG Y F, WANG J C, et al.. HfO2 optical films prepared by dual ion beam sputtering deposition ［J］. High Power Laser Part. Beams, 2007, 19(9):1543-1546. (in Chinese)

[2] AI-KUHAILI M F. Optical properties of hafnium oxide thin films and their application in energy-efficient windows ［J］. Opt. Mater., 2004, 27(3):383-387.

[3] HE G, ZHU L Q, LIU M, et al.. Optical and electrical properties of plasma-oxidation derived HfO2 gate dielectric films ［J］. Appl. Surf. Sci., 2007, 253(7):3413-3418.

[4] KHOSHMAN J M, KORDESCH M E. Optical properties of a-HfO2 thin films ［J］. Surf. Coatings Technol., 2006, 201(6):3530-3535.

[5] CHOW R, FALABELLA S, LOOMIS G E, et al.. Reactive evaporation of low-defect density hafnia ［J］. Appl. Opt., 1993, 32(28):5567-5574.

[6] 高卫东, 张伟丽, 范树海, 等. HfO2薄膜的结构对抗激光损伤阈值的影响 ［J］. 光子学报, 2005, 34(2):176-179.

    GAO W D, ZHANG W L, FAN S H, et al.. Effects of the structure of HfO2 thin films on its laser-induced damage threshold ［J］. Acta Photon. Sinica, 2005, 34(2):176-179. (in Chinese)

[7] 艾万君, 熊胜明. 单层二氧化铪 HfO2薄膜的特性研究 ［J］. 光电工程, 2012, 39(2):134-140.

    AI W J, XIONG S M. Characteristics of single layer HfO2 thin films ［J］. Opto-Electron. Eng., 2012, 39(2):134-140. (in Chinese)

[8] 邓文渊, 李春, 金春水. 电子束蒸发和离子束溅射 HfO2 紫外光学薄膜 ［J］. 中国光学, 2010, 3(6):630-636.

    ZHENG W Y, LI C, JIN C S. Ultraviolet HfO2 thin film by e-beam evaporation and ion beam sputtering ［J］. Chin. Opt., 2010, 3(6):630-636. (in Chinese)

[9] 谢永军, 赵福华, 魏伟, 等. 采用HfO2/SiO2溶胶-凝胶薄膜制备衍射光栅 ［J］. 光子学报, 2008, 37(1):133-135.

    XIE Y J, ZHAO F H, WEI W, et al.. Fabrication of diffractive grating using HfO2-SiO2 sol-gel film ［J］. Acta Photon. Sinica, 2008, 37(1):133-135. (in Chinese)

[10] 陈燕平, 余飞鸿. 薄膜厚度和光学常数的主要测试方法 ［J］. 光学仪器, 2006, 28(6):84-88.

    CHEN Y P, YU F H. Test methods for film thickness and optical constants ［J］. Opt. Instrum., 2006, 28(6):84-88. (in Chinese)

[11] JOHS B D, MCGAHAN W A, WOOLIMA J A. Optical analysis of complex multilayer structures using multiple data types ［J］. Thin Solid Films, 1994, 253(1-2):25-27.

[12] MCGAHAN W A, JOHS B, WOOLLAM J A. Techniques forellipsometric measurement of the thickness and optical constants of thin absorbing films ［J］. Thin Solid Films, 1993, 234(1-2):443-446.

[13] FUJIWARA H. Spectroscopic Ellipsometry: Principles and Applications ［M］. New York: John Wiley & Sons Press, 2007.

[14] NOLOT E, ANDR A. Systematic combination of X-ray reflectometry and spectroscopic ellipsometry: a powerful technique for reliable in-fab metrology ［J］. Thin Solid Films, 2011, 519(9):2782-2786.

[15] REN LL, GAO H F, GAO S T, et al.. Determination of multilayer thicknesses of GaAs/AlAs superlattice by grazing incidence X-ray reflectivity ［J］. Int. J. Metrol. Quality Eng., 2013, 4(2):81-86.

[16] PALIK E D. Handbook of Optical Constants of Solids ［M］. New York: Academic Press, 1998.

[17] HILFIKER J N, BUNGAY C L, SYNOWICKI R A, et al.. Progress in spectroscopic ellipsometry: applications from vacuum ultraviolet to infrared ［J］. J. Vac. Sci. Technol. A, 2003, 21(4):1103-1108.

[18] SUKAMTO J P H, MCMILLAN C S, SMYRL W.Photoelectrochemical investigations of thin metal-oxide films: TiO2, Al2O3, and HfO2 on the parent metals ［J］. Electrochim. Acta, 1993, 38(1):15-27.

[19] SANCHO-PARRAMON J, MODREANU M, BOSCH S, et al.. Optical characterization of HfO2 by spectroscopic ellipsometry: dispersion models and direct data inversion ［J］. Thin Solid Films, 2008, 516(22):7990-7995.

[20] DANE A D, VELDHUIS A, DE BOER D K G, et al.. Application of genetic algorithms for characterization of thin layered materials by glancing incidence X-ray reflectometry ［J］. Physica B, 1998, 253(3):254-268.

[21] LOGOTHETIDIS S, STERGIOUDIS G. Studies of density and surface roughness of ultrathin amorphous carbon films with regards to thickness with X-ray reflectometry and spectroscopic ellipsometry ［J］. Appl. Phys. Lett., 1997, 71(17):2463-2465.

[22] 张继涛, 李岩, 罗志勇. 一种可溯源的光谱椭偏仪标定方法 ［J］. 物理学报, 2010, 59(1):186-191.

    ZHANG J T, LI Y, LUO Z Y. A traceable calibration method for spectroscopic ellipsometry ［J］. Acta Phys. Sinica, 2010, 59(1):186-191. (in Chinese)

[23] JELLISON JR G E, MODINE F A. Parameterization of the optical functions of amorphous materials in theinterband region ［J］. Appl. Phys. Lett., 1996, 69(3):371-373.

[24] BRUGGEMAN D A G. Calculation of various physics constants inheterogenous substances I dielectricity constants and conductivity of mixed bodies from isotropic substances ［J］. Ann. Phys, 1935, 24(7):636-664.

[25] DURRANI S M A. CO-sensing properties of hafnium oxide thin films prepared by electron beam evaporation ［J］. Sens. Actuators B: Chem., 2007, 120(2):700-705.