激光与光电子学进展, 2007, 44 (11): 52, 网络出版: 2007-11-12
激光晶化制备多晶硅薄膜技术 
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Laser-Induced Crystallization of Polycrystalline Silicon Thin Film
薄膜 低温多晶硅 激光晶化 玻璃衬底 thin film low-temperature polycrystalline silicon laser-induced crystallization glass substrate
摘要
激光晶化是一种制作晶硅薄膜器件(如薄膜晶体管、太阳能电池)很有效的技术。展望了低温多晶硅薄膜的应用前景，详细介绍了近几年激光晶化制备多晶硅薄膜技术的研究成果，并就激光对非晶硅作用的原理作了简单讨论。
Abstract
Laser crystallization is an effective technique for obtaining high-performance polycrystallie Si thin-film devices, such as TFTs and solar cells. The future development of low-temperature polycrystalline silicon thin film is prospected. Mean-while, the latest progress about the laser-induced crystallization of amorphous silicon thin film is introduced in detail. The working principles of laser and amorphous silicon are reviewed briefly.
袁志军, 楼祺洪, 周军, 董景星, 魏运荣, 王之江. 激光晶化制备多晶硅薄膜技术[J]. 激光与光电子学进展, 2007, 44(11): 52. 袁志军, 楼祺洪, 周军, 董景星, 魏运荣, 王之江. Laser-Induced Crystallization of Polycrystalline Silicon Thin Film[J]. Laser & Optoelectronics Progress, 2007, 44(11): 52.
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