Preliminary study of the damage resistance of type I doubler KDP crystals at 532  nm

Yinbo Zheng; Lei Ding; Xinda Zhou; Rongsheng Ba; Jing Yuan; Honglei Xu; Xiaoyu Yang; Bo Chen; Jin Na; Yajun Li; Wanguo Zheng

doi:doi:10.3788/COL201614.051601

Chinese Optics Letters, 2016, 14 (5): 051601, Published Online: Aug. 6, 2018

Preliminary study of the damage resistance of type I doubler KDP crystals at 532 nm

Yinbo Zheng Lei Ding ^*Xinda Zhou Rongsheng Ba Jing Yuan Honglei Xu Xiaoyu Yang Bo Chen Jin Na Yajun Li Wanguo Zheng

Author Affiliations

Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China

Basic Information

DOI:	10.3788/COL201614.051601
中图分类号:	--
栏目:	Materials
项目基金:	The authors appreciate Li Ke-Yu for his fruitful discussions.
收稿日期:	Dec. 23, 2015
修改稿日期:	--
网络出版日期:	Aug. 6, 2018
通讯作者:	Lei Ding (dingleigongyong@126.com)
备注:	--

Yinbo Zheng, Lei Ding, Xinda Zhou, Rongsheng Ba, Jing Yuan, Honglei Xu, Xiaoyu Yang, Bo Chen, Jin Na, Yajun Li, Wanguo Zheng. Preliminary study of the damage resistance of type I doubler KDP crystals at 532 nm[J]. Chinese Optics Letters, 2016, 14(5): 051601.