一种基于线性模型的光刻投影物镜偏振像差补偿方法
[1] J. Kye, G. McIntyre, Y. Norihiro et al.. Polarization aberration analysis in optical lithography systems [C]. SPIE, 2006, 6154: 61540E
[2] B. Geh, J. Ruoff, J. Zimmermann et al.. The impact of projection lens polarization properties on lithographic process at hyper-NA [C]. SPIE, 2007, 6520: 65200F
[3] J. Ruoff, M. Totzeck. Using orientation Zernike polynomials to predict the imaging performance of optical systems with birefringent and partly polarizing components [C]. SPIE, 2010, 7652: 76521T
[4] G. R. McIntyre, J. Kye, H. Levinson. Polarization aberrations in hyper-numerical-aperture projection printing: a comparison of various representations [J]. J. Microlithogr. Microfabr. Microsyst., 2006, 5(3): 033001
[5] N. Kita. Technique to manage polarization aberrations [J]. Opt. Rev., 2009, 16(3): 305～312
[6] T. Matsuyama, N. Kita. Polarization aberration control for ArF projection lenses [C]. SPIE, 2009, 7274: 72741M
[7] T. Arai, A. Yamada, K. Mori et al.. Optimization procedure of exposure tools with polarization aberrations [C]. SPIE, 2008, 6924: 69241I
[8] H. H. Hopkins. Canonical pupil coordinates in geometrical and diffraction image theory [J]. Jpn. J. Appl. Phys., 1964, 1(suppl.1-1): 31～35
[9] A. K. Wong. Optical Imaging in Projection Micro-Lithography [M]. Bellingham: SPIE Press, 2005. 67～72, 102～107
[10] R. Clark Jones. A new calculus for the treatment of optical systems [J]. J. Opt. Soc. Am., 1941, 31(7): 488～493
[11] R. Barakat. Exponential versions of the Jones and Mueller-Jones polarization matrices [J]. J. Opt. Soc. Am. A, 1996, 13(1): 158～163
[12] N. Yamamoto, J. Kye, H. J. Levinson. Polarization aberration analysis using Pauli-Zernike representation [C]. SPIE, 2007, 6520: 65200Y
[13] M. Born, E. Wolf. Principles of Optics [M]. Cambridge: Cambridge University Press, 1999. 228～257
[14] V. Agudelo, P. Evanschitzky, A. Erdmann et al.. Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography [C]. SPIE, 2012, 8326: 832609
[15] M. Totzeck, P. Grupner, T. Heil et al.. Polarization influence on imaging [J]. J. Microlithogr. Microfabr. Microsyst., 2005, 4(3): 031108
[16] T. Yoshihara, B. Takeshita, A. Shigenobu et al.. New projection optics and aberration control system for the 45-nm node [C]. SPIE, 2007, 6520: 652022
[17] Z. C. Qiu, X. Z. Wang, Q. Y. Bi et al.. Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations [J]. Appl. Opt., 2009, 48(19): 3654～3663
涂远莹, 王向朝. 一种基于线性模型的光刻投影物镜偏振像差补偿方法[J]. 光学学报, 2013, 33(6): 0622002. Tu Yuanying, Wang Xiangzhao. Polarization Aberration Compensation Method for Lithographic Projection Lens Based on a Linear Model[J]. Acta Optica Sinica, 2013, 33(6): 0622002.
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