多晶硅表面陷阱坑形貌对表面光反射率的影响
[1] O. Powell, H. B. Harrison. Anisotropic etching of {100} and {110} planes in (100) silicon [J]. J. Micromech. Microeng., 2001, 11(3): 217~220
[2] J. Rentsch, N. Kohn, F. Bamberg et al.. Isotropic plasma texturing of mc-Si for industrial solar cell fabrication[C]. Photovoltaic Specialists Conference, 2005. Conference Record of the Thirty-first IEEE, 2005, 1316~1319
[3] M. A. Gonsálvez, R. M. Nieminen. Surface morphology during anisotropic wet chemical etching of crystalline silicon [J]. New J. Phys., 2003, 5: 100.1~100.28
[4] 郭志球, 柳锡运, 沈辉 等. 各向同性腐蚀法制备多晶硅绒面 [J]. 材料科学与工程学报, 2007, 25(1): 95~98
Guo Zhiqiu, Liu Xiyun, Shen Hui et al.. Isotropic texturing of multicrystalline silicon [J]. J. Mater. Sci. Engng., 2007, 25(1): 95~98
[5] 王涛, 王正志. 多晶硅太阳电池的酸腐蚀绒面技术 [J]. 电源技术, 2006, 30(12): 1020~1022
Wang Tao, Wang Zhengzhi. Summary on acidic texturing of multicrystalline silicon solar cells [J]. Chinese J. Power Sources, 2006, 30(12): 1020~1022
[6] 肖文明, 檀柏梅, 刘玉岭 等. 多晶Si太阳电池表面酸腐蚀制绒的研究 [J]. 微纳电子技术, 2009, 46(10): 627~631
Xiao Wenming, Tan Baimei, Liu Yuling et al.. Research on texturing of multi-crystalline silicon solar cells with acid etch [J]. Micronanoelectronic Technology, 2009, 46(10): 627~631
[7] L. A. Dobrzański, A. Drygaa. Processing of silicon surface by Nd∶YAG laser [J]. J. Achievements Mater. Manuf. Engng., 2006, 17(1-2): 321~324
[8] O. Schultz, G. Emanuel, W. Glunz et al.. Texturing of multicrystalline silicon with acidic wet chemical etching and plasma etching [C]. 3rd World Conference on Photovoltaic Energy Conversion, Osaka, Japan, 2003, 1360~1366
[9] P. Panek, M. Lipiński, J. Dutkiewicz. Texturization of multicrystalline silicon by wet chemical etching for silicon solar cells [J]. J. Mater. Sci., 2005, 40(6): 1459~1463
[10] 张发云, 叶建雄. 多晶硅表面酸腐蚀制备绒面研究 [J]. 光子学报, 2011, 40(2): 222~226
[11] 邵俊刚, 廖华, 黄小龙. 酸腐蚀液对多晶硅表面织构的影响 [J]. 太阳能学报, 2010, 31(12): 1563~1567
Shao Jungang, Liao Hua, Huang Xiaodong et al.. Influence of acidic solution on the texturization of multi-silicon [J]. Acta Energiae Solaris Sinica, 2010, 31(12): 1563~1567
[12] Y. Nishimoto, T. Ishihara, K. Namba. Investigation of acidic texturization for multicrystalline silicon solar cells [J]. J. Electrochem. Soc., 1999, 146(2): 457~461
[13] 周舟, 周健, 孙晓玮 等. 薄膜太阳能电池异型布拉格背反射结构设计与制作 [J]. 光学学报, 2011, 31(7): 0731002
[14] 王云峰, 李明, 林文贤 等. 平板式与槽式聚光太阳能电池组件性能分析 [J]. 光学学报, 2009, 29(8): 2287~2292
[15] 李国良, 李明, 王六玲 等. 阴影遮挡下空间太阳电池串联组件输出特性分析 [J]. 光学学报, 2011, 31(1): 0125001
[16] L. A. Dobrzański, A. Drygala, K. Golombek et al.. Laser surface treatment of mc Si for enhancing optical properties [J]. J. Mater. Process. Technol., 2008, 201: 291~296
[17] U. Gangopadhyay, S. K. Dhungel, P. K. Basu et al.. Comparative study of different approaches of multicrystalline silicon texturing for solar cell fabrication [J]. Sol. Energy Mater. Sol. Cells, 2007, 91(4): 285~289
[18] Jae Beom Park, Jong Sik Oh, Elly Gil et al.. Plasma texturing of multicrystalline silicon for solar cell using remote-type pin-to-plate dielectric barrier discharge [J]. J. Phys. D: Appl. Phys., 2009, 42(21): 1~6
钱勇, 冯仕猛. 多晶硅表面陷阱坑形貌对表面光反射率的影响[J]. 光学学报, 2012, 32(2): 0224001. Qian Yong, Feng Shimeng. Effect of Multi-Crystalline Silicon Pit-Trap Shape on the Optical Reflectance[J]. Acta Optica Sinica, 2012, 32(2): 0224001.