全球面变焦距光刻系统设计 下载: 631次
[1] B. H. John. Optical lithography: 40 years and holding [C]. SPIE, 2007, 6520: 652004
[2] 刘菲, 李艳秋. 大数值孔径产业化极紫外投影光刻物镜设计[J]. 光学学报, 2011, 31(2): 222003
[3] M. Tomoyuki, O. Yasuhiro, M. W. David. The lithographic lens: its hidtory and evolution [C]. SPIE, 2006, 6154: 615403
[4] Udo Dinger. Microlithography Project Objective and Projection Exposure Apparatus [P]. U.S.Patent U S20060198029.2006-9
[5] 马斌, 李林, 常军 等. 高分辨率折射式投影光刻物镜的研究[J]. 光学学报, 2009, 29(s2): 211~215
[6] 陈铭勇. 数字灰度光刻成像物镜设计[D]. 四川: 四川大学, 2007. 3~5
Chen Mingyong. Design of Objective for Digital Gray-Tone Lithography [D]. Sichuan: Sichuan University, 2007. 3~5
[7] Kafai Lai, Alan E. Rosenbluth, Geng Han et al.. Modeling polarization for hyper-NA lithography tools and masks [C]. SPIE, 2007, 6520: 65200D
[8] 许伟才. 投影光刻物镜的光学设计及像质补偿[D]. 长春: 中科院长春光学精密机械与物理研究所, 2011. 5
Xu Weicai. Optical Design and Imaging Performance Compensation for the Lithographic Lens [D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics, China Academy of Sciences, 2011.5
[9] 迟泽英, 陈文建. 应用光学于光学设计基础[M]. 南京: 东南大学出版社, 2008. 54~55
Chi Zeying, Chen Wenjian. Applied Optics and Elements of Optical Design [M]. Nanjin: Southeast University Press, 2008. 54~55
[10] 黄玲. 两种变焦距光学系统的设计研究[D]. 浙江: 浙江大学, 2002. 15~33
Huang Lin. Research on Two kinds of Zoom Optical System Design [D]. Zhejiang: Zhejiang University, 2002. 15~33
[11] 张以谟. 应用光学[M]. 北京:电子工业出版社, 2010. 636~655
Zhang Yimo. Applied Optics [M]. Beijng: Publishing House of Electronics Industry, 2010. 636~655
[12] 梁来顺. 变焦距系统设计的快速求解[J]. 应用光学, 2004, 25(1): 17~20
Liang Laishun. A rapid computing method zoom optical design [J]. Appl. Opt., 2004, 25(1): 17~20
[13] J. M. Geary. Introduction to Lens Design [M]. U.S.: Willmann-Bell,Inc
[14] 王之江. 实用光学技术手册 [M]. 北京: 机械工业出版社, 2007. 518~550
Wang Zhijiang. Applied Optics Technical Handbook [M]. Beijing: China Machine Press, 2007. 518~550
[15] 王之江. 光学设计理论基础 [M]. 北京: 科学出版社, 1985. 321~345
Wang Zhijiang. Theory Elements of Optical Design [M]. Beijing: Science Press, 1985. 321~345
[16] 袁旭沧. 光学设计 [M]. 北京:北京理工大学出版社, 1988. 80~81
Yuan Xucang. Optical Design [M]. Beijing: Beigjing Institute of Technology Press, 1988. 80~81
吕博, 刘伟奇, 康玉思, 冯睿, 柳华, 魏忠伦. 全球面变焦距光刻系统设计[J]. 光学学报, 2013, 33(6): 0622001. Lü Bo, Liu Weiqi, Kang Yusi, Feng Rui, Liu Hua, Wei Zhonglun. Design of All Spherical Surfaces Zoom Lithographic System[J]. Acta Optica Sinica, 2013, 33(6): 0622001.