光学学报, 2019, 39 (8): 0824001, 网络出版: 2019-08-07
周期性起伏四层磁性薄膜的克尔效应 
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Kerr Effect for Orderly Corrugated Magnetic Quadrilayer Thin Film
图 & 表
图 1. HfO2(15 nm)/Co (15 nm)/HfO2(30 nm)/Ag (40 nm) 样品。(a) 磁控溅射后的样品的原子力显微图;(b)样品表面的轮廓图; (c)薄膜的磁光克尔回线;(d)入射光场的偏振示意图, PR(Photoresist)为光刻胶, 入射光为p光
Fig. 1. Sample of HfO2 (15 nm)/Co (15 nm)/HfO2 (30 nm)/Ag (40 nm). (a) Atomic force micrograph of the sample after magnetron sputtering; (b) 3D surface profile of the array; (c) Kerr hysteresis loop of the thin film; (d) schematic of p-polarized light incidence to surface of the nanocorrugation array, PR stands for photoresist
图 2. 条形方向与入射面垂直时,3个不同条纹宽度的样品的纵向克尔谱与反射谱。(a)纵向克尔谱;(b)反射谱
Fig. 2. Longitudinal Kerr spectra and reflectivity of the three samples with different stripe widths when the stripes’ direction is perpendicular to the incident plane. (a) Longitudinal Kerr spectra; (b) reflection spectra
图 3. 沿入射面(z-x面)4层膜的条形阵列场分量Ez的空间分布。(a)宽度为160 nm; (b)宽度为180 nm。入射波长 λ=537 nm,入射角度45°
Fig. 3. Distribution of electric field intensity Ez for cutting cross section (z-x coordinate plane). (a) With the stripe width of 160 nm; (b) with the stripe width of 180 nm. The incident wavelength is λ=537 nm, the incident angle is 45°
图 4. 条形方向与入射面垂直时,不同中间层HfO2厚度的样品的纵向克尔谱和反射谱。(a)纵向克尔谱,(b)反射谱
Fig. 4. Longitudinal Kerr spectra and reflectivity for the two samples with different thicknesses of HfO2 when the stripes’ direction is perpendicular to the incident plane. (a) Longitudinal Kerr spectra; (b) reflection spectra
图 5. 3种中间层厚度不同的样品的极向克尔谱和反射谱。(a) 极克尔谱; (b) 反射谱
Fig. 5. Polar Kerr spectra and reflection spectra of the samples with different intermediate layers’ thicknesses of HfO2. (a) Polar Kerr spectra; (b) reflection spectra
图 6. 两样品与z-x平面平行的截面内相对电场强度E/E0空间分布图。(a) HfO2 (15 nm)/Co (15 nm)/HfO2 (15 nm)/Ag (40 nm); (b) HfO2 (15 nm)/Co (15 nm)/HfO2 (45 nm)/Ag (40 nm)
Fig. 6. Distribution of normalized electric field intensity E/E0 in the cutting cross section parallel to z-x plane. (a) HfO2 (15 nm)/Co (15 nm)/HfO2 (15 nm)/Ag (40 nm); (b) HfO2 (15 nm)/Co (15 nm)/HfO2 (45 nm)/Ag (40 nm)
张绍银, 艾树涛. 周期性起伏四层磁性薄膜的克尔效应[J]. 光学学报, 2019, 39(8): 0824001. Shaoyin Zhang, Shutao Ai. Kerr Effect for Orderly Corrugated Magnetic Quadrilayer Thin Film[J]. Acta Optica Sinica, 2019, 39(8): 0824001.
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