Chinese Optics Letters, 2019, 17 (11): 113101, Published Online: Sep. 12, 2019
Effect of annealing on the damage threshold and optical properties of HfO2/Ta2O5/SiO2 high-reflection film 
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Basic Information
| DOI: | 10.3788/COL201917.113101 |
| 中图分类号: | -- |
| 栏目: | Thin films |
| 项目基金: | This work was supported by the Jilin Science and Technology Development Plan (Nos. 20180519018JH and 20190302052GX), the Jilin Education Department “135” Science and Technology (No. JJKH20190543KJ), the National Natural Science Foundation of China (No. 11474038), and the Excellent Youth Foundation of Jilin Province (No. 20180520194JH). |
| 收稿日期: | May. 7, 2019 |
| 修改稿日期: | -- |
| 网络出版日期: | Sep. 12, 2019 |
| 通讯作者: | Jie Fan (fanjie@cust.edu.cn) |
| 备注: | -- |
Jianing Dong, Jie Fan, Sida Mao, Yunping Lan, Yonggang Zou, Haizhu Wang, Jiabin Zhang, Xiaohui Ma. Effect of annealing on the damage threshold and optical properties of HfO2/Ta2O5/SiO2 high-reflection film[J]. Chinese Optics Letters, 2019, 17(11): 113101.
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