Effect of annealing on the damage threshold and optical properties of HfO2/Ta2O5/SiO2 high-reflection film

Jianing Dong; Jie Fan; Sida Mao; Yunping Lan; Yonggang Zou; Haizhu Wang; Jiabin Zhang; Xiaohui Ma

doi:doi:10.3788/COL201917.113101

Chinese Optics Letters, 2019, 17 (11): 113101, Published Online: Sep. 12, 2019

Effect of annealing on the damage threshold and optical properties of HfO₂/Ta₂O₅/SiO₂ high-reflection film Download： 959次

Jianing Dong Jie Fan ^*Sida Mao Yunping Lan Yonggang Zou Haizhu Wang Jiabin Zhang Xiaohui Ma

Author Affiliations

State Key Laboratory of High-Power Semiconductor Laser, Changchun University of Science and Technology, Changchun 130022, China

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Jianing Dong, Jie Fan, Sida Mao, Yunping Lan, Yonggang Zou, Haizhu Wang, Jiabin Zhang, Xiaohui Ma. Effect of annealing on the damage threshold and optical properties of HfO₂/Ta₂O₅/SiO₂ high-reflection film[J]. Chinese Optics Letters, 2019, 17(11): 113101.

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Effect of annealing on the damage threshold and optical properties of HfO₂/Ta₂O₅/SiO₂ high-reflection film Download： 959次

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