Micro-channel etching characteristics enhancement by femtosecond laser processing high-temperature lattice in fused silica glass

Dongkai Chu; Xiaoyan Sun; Youwang Hu; Xinran Dong; Kai Yin; Zhi Luo; Jianying Zhou; Cong Wang; Ji'an Duan

doi:doi:10.3788/COL201715.071403

Chinese Optics Letters, 2017, 15 (7): 071403, Published Online: Jul. 20, 2018

Micro-channel etching characteristics enhancement by femtosecond laser processing high-temperature lattice in fused silica glass Download： 960次

Dongkai Chu Xiaoyan Sun Youwang Hu ^*Xinran Dong Kai Yin Zhi Luo Jianying Zhou Cong Wang Ji'an Duan

Author Affiliations

The State Key Laboratory of High Performance Complex Manufacturing, College of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China

Figures & Tables

Fig. 1. Schematic diagram of the ultrafast double pulse femtosecond lasers fabrication system. M, mirror; ND, neutral density attenuator.

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Fig. 2. Top view (XZ plane) SEM images (a) where $Φ$ is 0°; (b) where $Φ$ is 90°.

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Fig. 3. (a) Microscopic images of the etched micro-channel irradiated by different time delays. (b) Etching rate of a single pulse and a double pulse.

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Fig. 4. Side view (YZ plane) the light entrance SEM images of long range periodic nanostructures formed by different time delays after being polished and shortly etched. (a) $Δ t = 0 fs$ ; (b) $Δ t = 10 ps$ ; (c) $Δ t = 100 ps$ .

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Fig. 5. Relationship between the etching depth and the pulse energy ratio.

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Dongkai Chu, Xiaoyan Sun, Youwang Hu, Xinran Dong, Kai Yin, Zhi Luo, Jianying Zhou, Cong Wang, Ji'an Duan. Micro-channel etching characteristics enhancement by femtosecond laser processing high-temperature lattice in fused silica glass[J]. Chinese Optics Letters, 2017, 15(7): 071403.

Micro-channel etching characteristics enhancement by femtosecond laser processing high-temperature lattice in fused silica glass Download： 960次

Fig. 1. Schematic diagram of the ultrafast double pulse femtosecond lasers fabrication system. M, mirror; ND, neutral density attenuator.

Fig. 2. Top view (XZ plane) SEM images (a) where $Φ$ is 0°; (b) where $Φ$ is 90°.

Fig. 3. (a) Microscopic images of the etched micro-channel irradiated by different time delays. (b) Etching rate of a single pulse and a double pulse.

Fig. 4. Side view (YZ plane) the light entrance SEM images of long range periodic nanostructures formed by different time delays after being polished and shortly etched. (a) $Δ t = 0 fs$ ; (b) $Δ t = 10 ps$ ; (c) $Δ t = 100 ps$ .

Fig. 5. Relationship between the etching depth and the pulse energy ratio.

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Micro-channel etching characteristics enhancement by femtosecond laser processing high-temperature lattice in fused silica glass Download： 960次

Fig. 1. Schematic diagram of the ultrafast double pulse femtosecond lasers fabrication system. M, mirror; ND, neutral density attenuator.

Fig. 2. Top view (XZ plane) SEM images (a) where Φ is 0°; (b) where Φ is 90°.

Fig. 3. (a) Microscopic images of the etched micro-channel irradiated by different time delays. (b) Etching rate of a single pulse and a double pulse.

Fig. 4. Side view (YZ plane) the light entrance SEM images of long range periodic nanostructures formed by different time delays after being polished and shortly etched. (a) Δt=0 fs; (b) Δt=10 ps; (c) Δt=100 ps.

Fig. 5. Relationship between the etching depth and the pulse energy ratio.

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Fig. 2. Top view (XZ plane) SEM images (a) where $Φ$ is 0°; (b) where $Φ$ is 90°.

Fig. 4. Side view (YZ plane) the light entrance SEM images of long range periodic nanostructures formed by different time delays after being polished and shortly etched. (a) $Δ t = 0 fs$ ; (b) $Δ t = 10 ps$ ; (c) $Δ t = 100 ps$ .