皮秒激光-化学复合法制备高效减反射晶硅表面微结构研究

基于皮秒激光的“冷加工”特点，进行了用皮秒激光辐照结合快速化学腐蚀(NaOH 溶液：质量分数为4%，不大于3 min，80 ℃水浴)调控工艺制备高效减反射晶硅表面微结构的研究，在400~1000 nm 波长的宽光谱范围内，获得了微-纳双结构微孔阵列和圆顶锥形周期性阵列两种减反射表面，前者的平均反射率低于5%，后者的平均反射率低于10%。制备过程中工艺可控性强，无需掩膜和真空环境。研究了激光工艺参数和化学腐蚀参数的不同调控匹配在微结构单元形成中的作用机制，分析了所制备表面微结构的减反射机理，为太阳能电池和其他半导体器件中硅基减反射表面微结构的低成本激光可控制造提供了重要的指导。

Abstract

Based on the“cold processing”property of picosecond laser, the investigation on the hybrid technique using picosecond laser irradiation followed by short-time chemical corrosion (NaOH solution, mass fraction: 4%, lass than 3 min, water bath: 80 ℃) to fabricate high performance silicon antireflection textures is carried out. Over a broad wavelength range of 400~1000 nm, the average reflectance of the two fabricated novel surface textures, which are the micro-nano hierarchical structure texture and the dome-cone array texture, both reduce to below 10%. Even the average reflection of the former reduces to below 5%. The fabrication can be carried out with high controllability and without using the etch mask and vacuum circumstance. The mechanism of different regulation matching of the laser process parameters and chemical corrosion parameters acting on the formation of the novel antireflection textures is studied. The antireflection mechanism of the textures is also analyzed. Results provide an important guide for laser fabrication of high performance silicon antireflection textures for the application in solar cells and other semiconductor devices in a low-cost and controllable way.

参考文献

[1] Lu Zheng, Chong Geng, Qingfeng Yan. Hierarchically ordered arrays based on solvent vapor annealed colloidal monolayers for antireflective coating[J]. Thin Solid Films, 2013, 544: 403-406.

[2] B G Prevo, E W Hon, O D Velev. Assembly and characterization of colloid-based antireflective coatings on multicrystalline silicon solar cells[J]. J Mater Chem, 2007, 17(8): 791-799.

[3] C H Sun, P Jiang, B Jiang. Broadband moth-eye antireflection coatings on silicon[J]. Appl Phys Lett, 2008, 92(6): 061112.

[4] Grauvogl M, Aberle A, Hezel R. 17.1% Efficient truncated-pyramid inversion-layer silicon solar cells[C]. 25th IEEE Photovoltaic Specialists Conference, 1996: 433-436.

[5] 陈刚, 马逊, 刘祖明, 等. 单晶Si材料表面碱织构实验研究[J]. 器件制造与应用, 2010, 35(2): 137-141.

Chen Gang, Ma Xun, Liu Zuming, et al.. Research on monocrystalline silicon surface etching[J]. Manufacturing and Application of Device, 2010, 35(2): 137-141.

[6] Nishimoto Y, Namba K. Investigation of texturization for crystalline silicon solar cells with sodium carbonates solutions[J]. Solar Energy Materials and Solar Cells, 2000, 61(4): 393-402.

[7] 周春兰, 王文静, 赵雷, 等. 单晶硅表面均匀小尺寸金字塔制备及其特性研究[J]. 物理学报, 2010, 59(8): 5777-5783.

Zhou Chunlan, Wang Wenjing, Zhao Lei, et al.. Preparation and characterization of homogeneity and the pyramids on the textured single silicon crystal[J]. Acta Physica Sinica, 2010, 59(8): 5777-5783.

[8] 席珍强, 杨德仁, 吴丹, 等. 单晶硅太阳电池的表面织构化[J]. 太阳能学报, 2002, 23(3): 285-289.

Xi Zhenqiang, Yang Deren, Wu Dan, et al.. Texturization of monocrystalline silicon for solar cells[J]. Acta Energiae Solaris Sinica, 2002, 23(3): 285-289.

[9] 龙学文, 白晶, 刘欣, 等. 飞秒激光在铽镓石榴石中的光刻光波导[J]. 光学学报, 2014, 34(4): 0432002.

Long Xuewen, Bai Jing, Liu Xin, et al.. Inscription of waveguides in terbium gallium garnet using femtosecond laser[J]. Acta Optica Sinica, 2014, 34(4): 0432002.

[10] 陈超, 杨先辉, 王闯, 等. 飞秒激光刻写高阶倾斜光纤Bragg光栅[J]. 光学学报, 2014, 34(5): 0506001.

Chen Chao, Yang Xianhui, Wang Chuang, et al.. High-order tilted fiber Bragg gratings carved with femtosecond laser[J]. Acta Optica Sinica, 2014, 34(5): 0506001.

[11] 沈斌, 李海元, 熊怀, 等. 多孔性二氧化硅减反膜胶体规律性研究[J]. 中国激光, 2014, 41(9): 0906002.

Shen Bin, Li Haiyuan, Xiong Huai, et al.. Study on the colloidal regularity of porous SiO2 antireflective of porous SiO2 antireflective coatings[J]. Chinese J Lasers, 2014, 41(9): 0906002.

[12] 张竹青, 王强, 花国然, 等. YAG 激光频率对a：H-Si 薄膜微晶化的影响[J]. 激光与光电子学进展, 2013, 50(2): 021406.

Zhang Zhuqing, Wang Qiang, Hua Guoran, et al.. Influence of YAG laser frequency on a:H-Si thin films micro-crystallization[J]. Laser & Optoelectronics Progress, 2013, 50(2): 021406.

[13] 张超, 张庆茂, 郭亮, 等. 非晶硅薄膜太阳能电池的紫外激光制绒工艺[J]. 中国激光, 2013, 40(7): 0707004.

Zhang Chao, Zhang Qingmao, Guo Liang, et al.. Texturing process with 355 nm laser for amorphous silicon film solar cell[J]. Chinese J Lasers, 2013, 40(7): 0707004.

[14] Zhang Shan, Hu Xiaoning, Liao Yang, et al.. Microstructuring of anti-reflection film for HgCdTe/Si IRFPA with femtosecond laser pulse[J]. Chin Opt Lett, 2013, 11(3): 033101.

[15] Dobrzanski L A, Drygala A. Laser processing of multicrystalline silicon for texturization of solar cells[J]. Journal of Materials Processing Technology, 2007, 191(1-3): 228-231.

[16] Kwang Ryul Kim, Tae Hoon Kim, Hyun Ae Park, et al.. UV laser direct texturing for high efficiency multicrystalline silicon solar cell [J]. Applied Surface Science, 2013, 264: 404-409.

[17] K Kumar, K C Lee, J Nogami, et al.. Ultrafast laser direct hard-mask writing for high performance inverted-pyramidal texturing of silicon[C]. IEEE Photovoltalic Specialists Conference, 2012: 002182-002185.

[18] 王学孟, 赵汝强, 沈辉, 等. 用于太阳能电池的多晶硅激光表面织构化研究[J]. 激光与光电子学进展, 2010, 47(1): 011401.

Wang Xuemeng, Zhao Ruqiang, Shen Hui, et al.. Laser surface texturation of multicrystalline silicon for solar cell[J]. Laser & Optoelectronics Progress, 2010, 47(1): 011401.

[19] Tsing-Hua Her, Richard J Finlay, Claudia, et al.. Microstructuring of silicon with femtosecond laser pulses[J]. Applied Physics Letters, 1998, 73(12): 1673-1675.

[20] 李平, 王煜, 冯国进, 等. 超短激光脉冲对硅表面微构造的研究[J]. 中国激光, 2006, 33(12): 1688-1691.

Li Ping, Wang Yu, Feng Guojin, et al.. Study of silicon micro-structuring using ultra-short laser pulses[J]. Chinese J Lasers, 2006, 33(12): 1688-1691.

[21] 沈泽南, 刘邦武, 夏洋, 等. 黑硅制备及应用进展[J]. 固体电子学研究与进展, 2011, 31(4): 387-392.

Shen Zenan, Liu Bangwu, Xia Yang, et al.. Advances in fabrication and application of black silicon[J]. Research & Progress of SSE, 2011, 31(4): 387-392.

[22] 季凌飞, 凌晨, 李秋瑞, 等. 皮秒激光工程应用研究现状与发展分析[J]. 机械工程学报, 2014, 50(5): 115-126.

Ji Lingfei, Ling Chen, Li Qiurui, et al.. Research progress and development of industrial application of picosecond laser processing [J]. Journal of Mechanical Engineering, 2014, 50(5): 115-126.

[23] 王国彪. 光制造科学与技术的现状和展望[J]. 机械工程学报, 2011, 47(21): 157-169.

Wang Guobiao. Photonic manufacturing science & technology: overview and outlook[J]. Journal of Mechanical Engineering, 2011, 47(21): 157-169.

[24] Sha Tao, Benxin Wu, Yun Zhou, et al.. Thermal modeling and experimental study of infrared nanosecond laser ablation of silicon[J]. J Appl Phy, 2009, 106(12): 123507.

吕晓占, 季凌飞, 吴燕, 林真源, 闫胤洲. 皮秒激光-化学复合法制备高效减反射晶硅表面微结构研究[J]. 中国激光, 2015, 42(4): 0403006. Lü Xiaozhan, Ji Lingfei, Wu Yan, Lin Zhenyuan, Yan Yinzhou. Fabrication of High Performance Anti-Reflection Silicon Surface by Picosecond Laser Scanning Irradiation with Chemical Corrosion[J]. Chinese Journal of Lasers, 2015, 42(4): 0403006.

皮秒激光-化学复合法制备高效减反射晶硅表面微结构研究

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