Threshold Property of Photoresist Film for Two-photon Optical Memory
[1] D. A. Parthenopoulos, P. M. Rentzepis. Three-dimensional optical storage memory. Science, 1989, 245:843~845
[2] Y. Kawata, H. Ishitobi, S. Kawata. Use of two-photon absorption in a photorefractive crystal for three-dimensional optical memory. Opt. Lett., 1998,23(10):756~758
[3] D. Day, M. Gu, A. Smallridge. Use of two-photon excitation for erasable-rewritable three-dimensional bit optical data storage in a photorefractive polymer. Opt.Lett., 1999,24(14):948~950
[4] M. Gu, D. Day. Use of continuous-wave illumination for two-photon three-dimensional optical bit data storage in a photobleaching polymer. Opt. Lett., 1999,24(5):288~290
[5] G. Witzgall, R. Vrijen, E. Yablonovitch et al.. Single-shot two-photon exposure of commerial photoresist for the production of three-dimensional structures. Opt. Lett., 1998,23(22):1745~1747
ZHANG Jiangying, MING Hai, LIANG Zhongcheng, WANG Pei, XIE Jianping, XIE Aifang, ZHANG Zebo. Threshold Property of Photoresist Film for Two-photon Optical Memory[J]. Chinese Journal of Lasers B, 2001, 10(5): 365. ZHANG Jiangying, MING Hai, LIANG Zhongcheng, WANG Pei, XIE Jianping, XIE Aifang, ZHANG Zebo. [J]. 中国激光(英文版), 2001, 10(5): 365.