光学学报, 2017, 37 (6): 0614004, 网络出版: 2017-06-08   

直边衍射驻波场中铬原子三维沉积特性分析

Analysis of Three-Dimensional Deposition Characteristics of Chromium atoms in the Straight Edge Diffraction Standing Wave Field
作者单位
1 桂林电子科技大学电子工程与自动化学院, 广西 桂林 541004
2 广西高校光电信息处理重点实验室, 广西 桂林 541004
摘要
利用近共振激光驻波场操纵中性原子实现纳米级条纹沉积是一种新型的研制纳米结构长度标准传递方法。在会聚原子过程中, 由于沉积基片的存在, 激光驻波场内会产生直边衍射现象, 从而影响原子的运动轨迹及沉积光栅。建立了直边衍射扰动下激光驻波场模型, 通过四阶龙格-库塔法, 对铬原子的三维运动轨迹及沉积效果进行仿真。考虑到激光功率与失谐量的影响, 从半峰全宽(FWHM)和对比度入手, 对铬原子运动轨迹及沉积条纹特性进行分析。结果表明, 当激光功率为3.93 mW, 失谐量为200 MHz时, 原子沉积光栅的FWHM为6.043 nm, 对比度为0.863, 原子沉积光栅的质量最佳。与经典模型相比, 该模型考虑了驻波场中直边衍射的影响, 所得模拟结果更接近实际, 对实验有理论指导意义。
Abstract
Nanostructures stripe deposition technique is a new method to develop nanostructures length standard transmission with the near resonance laser standing wave field manipulation in neutral atoms. In the process of focusing atoms, due to the presence of deposition substrate, a straight edge diffraction phenomenon occurs in the laser standing wave field, which affects the atomic trajectory and deposition grating. The model of laser standing wave field is established under the straight edge diffraction disturbance, and the three-dimensional trajectory and deposition characteristics of chromium atoms are simulated using the Runge-Kutta method. Considering the influence of laser power and detuning amount, we analyze the trajectory and deposition characteristics of chromium atoms from the full width at half maximum (FWHM) and the contrast. The results show that when the laser power and the detuning amount are 3.93 mW and 200 MHz, the FWHM and contrast of atomic deposition grating are 6.043 nm and 0.863, respectively. Under this condition, the best quality of atomic sedimentary grating can be acquired. Compared with the classical model, this model has considered the influence of standing wave field of straight edge diffraction disturbance, the simulation results are closer to the actual situation and can be theoretical guidance to the experiment.
参考文献

[1] 李同保. 纳米计量与传递标准[J]. 上海计量测试, 2005, 32(1): 8-13.

    Li Tongbao. Nanometrology and transfer standard[J]. Shanghai Measurement and Testing, 2005, 32(1): 8-13.

[2] 蔡惟泉, 李传文, 霍芸生, 等. 原子光刻[J]. 物理学报, 1999, 48(4): 611-619.

    Cai Weiquan, Li Chuanwen, Huo Yunsheng, et al. Atom lithography[J]. Acta Physica Sinica, 1999, 48(4): 611-619.

[3] 王育竹, 徐 震. 激光冷却及其在科学技术中的应用[J]. 物理学进展, 2005, 25(4): 347-352.

    Wang Yuzhu, Xu Zhen. Laser cooling and it′s applications in science and technology[J]. Progress in Physics, 2005, 25(4): 347-352.

[4] Fioretti A, Camposeo A, Tantussi F, et al. Atomic lithography with barium atoms[J]. Applied Surface Science, 2005, 248(1-4): 196-199.

[5] Chen X Z, Yao H M, Chen X N. Classical simulation of atomic beam focusing and deposition for atom lithography[J]. Chinese Optics Letters, 2004, 2(4): 187-189.

[6] McClelland J J, Hill S B, Pichler M, et al. Nanotechnology with atom optics[J]. Science and Technology of Advanced Materials, 2004, 5(5-6): 575-580.

[7] McClelland J J, Scholten R E, Palm E C, et al. Laser-focused atomic deposition[J]. Science, 1993, 262(5135): 877-880.

[8] 卢向东, 李同保, 马 艳. 激光会聚原子沉积技术的原子沟道化研究[J]. 光学学报, 2011, 31(s1): s100515.

    Lu Xiangdong, Li Tongbao, Ma Yan. Study of channeling atoms in laser-focused atomic deposition technology[J]. Acta Optica Sinica, 2011, 31(s1): s100515.

[9] 张宝武, 姚芦鹬, 陈 君, 等. 高斯激光非准直性对激光会聚铬原子沉积的影响[J]. 光学学报, 2015, 35(6): 0602001.

    Zhang Baowu, Yao Luyu, Chen Jun, et al. Effects of non-collimation of Gaussian laser on laser-focused Cr atom deposition[J]. Acta Optica Sinica, 2015, 35(6): 0602001.

[10] 张文涛, 朱保华, 熊显名. 中性钠原子在激光驻波场中的运动特性研究[J]. 物理学报, 2011, 60(3): 183-189.

    Zhang Wentao, Zhu Baohua, Xiong Xianming. The research of motorial characteristic of sodium atoms in standing wave field[J]. Acta Physica Sinica, 2011, 60(3): 183-189.

[11] 张宝武, 张文涛, 王道档, 等. 基片位置对激光会聚铬原子沉积的影响[J]. 光学学报, 2014, 34(8): 0805002.

    Zhang Baowu, Zhang Wentao, Wang Daodang, et al. Effect of substrate position on laser-focused Cr atom deposition[J]. Acta Optica Sinica, 2014, 34(8): 0805002.

[12] 黄长兵. 沉积基片衍射效应对铬原子沉积效果的影响[D]. 桂林: 桂林电子科技大学, 2012: 10-16.

    Huang Changbing. The influence of the diffraction effect of sedimentary substrate to the deposited Chromiumatom effect[D]. Guilin: Guilin University of Electronic Technology, 2012: 10-16.

[13] 张萍萍, 马 艳, 张宝武, 等. 激光会聚铬原子光栅三维特性分析[J]. 光学学报, 2011, 31(11): 1114001.

    Zhang Pingping, Ma Yan, Zhang Baowu, et al. Properties of 3D nanostructures fabricated by laser-focused Cr atomic deposition[J]. Acta Optica Sinica, 2011, 31(11): 1114001.

[14] 陈 晟, 马 艳, 张萍萍, 等. 原子纳米光刻中双层光学掩膜的实现方法研究[J]. 红外与激光工程, 2014, 43(7): 2070-2073.

    Chen Sheng, Ma Yan, Zhang Pingping, et al. Production of double-layer light mask in atom nano-lithography[J]. Infrared and Laser Engineering, 2014, 43(7): 2070-2073.

伊路福, 熊显名, 张文涛, 占平平. 直边衍射驻波场中铬原子三维沉积特性分析[J]. 光学学报, 2017, 37(6): 0614004. Yi Lufu, Xiong Xianming, Zhang Wentao, Zhan Pingping. Analysis of Three-Dimensional Deposition Characteristics of Chromium atoms in the Straight Edge Diffraction Standing Wave Field[J]. Acta Optica Sinica, 2017, 37(6): 0614004.

本文已被 1 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!