直边衍射驻波场中铬原子三维沉积特性分析
[1] 李同保. 纳米计量与传递标准[J]. 上海计量测试, 2005, 32(1): 8-13.
Li Tongbao. Nanometrology and transfer standard[J]. Shanghai Measurement and Testing, 2005, 32(1): 8-13.
[2] 蔡惟泉, 李传文, 霍芸生, 等. 原子光刻[J]. 物理学报, 1999, 48(4): 611-619.
Cai Weiquan, Li Chuanwen, Huo Yunsheng, et al. Atom lithography[J]. Acta Physica Sinica, 1999, 48(4): 611-619.
[3] 王育竹, 徐 震. 激光冷却及其在科学技术中的应用[J]. 物理学进展, 2005, 25(4): 347-352.
Wang Yuzhu, Xu Zhen. Laser cooling and it′s applications in science and technology[J]. Progress in Physics, 2005, 25(4): 347-352.
[4] Fioretti A, Camposeo A, Tantussi F, et al. Atomic lithography with barium atoms[J]. Applied Surface Science, 2005, 248(1-4): 196-199.
[6] McClelland J J, Hill S B, Pichler M, et al. Nanotechnology with atom optics[J]. Science and Technology of Advanced Materials, 2004, 5(5-6): 575-580.
[7] McClelland J J, Scholten R E, Palm E C, et al. Laser-focused atomic deposition[J]. Science, 1993, 262(5135): 877-880.
[8] 卢向东, 李同保, 马 艳. 激光会聚原子沉积技术的原子沟道化研究[J]. 光学学报, 2011, 31(s1): s100515.
Lu Xiangdong, Li Tongbao, Ma Yan. Study of channeling atoms in laser-focused atomic deposition technology[J]. Acta Optica Sinica, 2011, 31(s1): s100515.
[9] 张宝武, 姚芦鹬, 陈 君, 等. 高斯激光非准直性对激光会聚铬原子沉积的影响[J]. 光学学报, 2015, 35(6): 0602001.
[10] 张文涛, 朱保华, 熊显名. 中性钠原子在激光驻波场中的运动特性研究[J]. 物理学报, 2011, 60(3): 183-189.
Zhang Wentao, Zhu Baohua, Xiong Xianming. The research of motorial characteristic of sodium atoms in standing wave field[J]. Acta Physica Sinica, 2011, 60(3): 183-189.
[11] 张宝武, 张文涛, 王道档, 等. 基片位置对激光会聚铬原子沉积的影响[J]. 光学学报, 2014, 34(8): 0805002.
[12] 黄长兵. 沉积基片衍射效应对铬原子沉积效果的影响[D]. 桂林: 桂林电子科技大学, 2012: 10-16.
Huang Changbing. The influence of the diffraction effect of sedimentary substrate to the deposited Chromiumatom effect[D]. Guilin: Guilin University of Electronic Technology, 2012: 10-16.
[13] 张萍萍, 马 艳, 张宝武, 等. 激光会聚铬原子光栅三维特性分析[J]. 光学学报, 2011, 31(11): 1114001.
[14] 陈 晟, 马 艳, 张萍萍, 等. 原子纳米光刻中双层光学掩膜的实现方法研究[J]. 红外与激光工程, 2014, 43(7): 2070-2073.
Chen Sheng, Ma Yan, Zhang Pingping, et al. Production of double-layer light mask in atom nano-lithography[J]. Infrared and Laser Engineering, 2014, 43(7): 2070-2073.
伊路福, 熊显名, 张文涛, 占平平. 直边衍射驻波场中铬原子三维沉积特性分析[J]. 光学学报, 2017, 37(6): 0614004. Yi Lufu, Xiong Xianming, Zhang Wentao, Zhan Pingping. Analysis of Three-Dimensional Deposition Characteristics of Chromium atoms in the Straight Edge Diffraction Standing Wave Field[J]. Acta Optica Sinica, 2017, 37(6): 0614004.