中国激光, 1997, 24 (1): 35, 网络出版: 2006-10-31
微透镜列阵的离子束刻蚀及衍射效率测量
Ion Beam Etching of Binary Optics Microlens Arrays and the Test of Diffraction Efficiency
摘要
采用Kaufman离子刻蚀微透镜列阵并采用实时检测系统对刻蚀深度进行了控制.提出了测量微透镜列阵衍射效率的一种方法,对测量误差进行了讨论.
Abstract
A binary optics microlens array (BM) was fabricated by using ion beam teching. The real-time test of etching depth in vacuum enviroment was performed. A noval method of measuring the BM diffraction efficiency was presented.
参考文献
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赵光兴, 杨国光, 陈洪璆, 侯西云. 微透镜列阵的离子束刻蚀及衍射效率测量[J]. 中国激光, 1997, 24(1): 35. 赵光兴, 杨国光, 陈洪璆, 侯西云. Ion Beam Etching of Binary Optics Microlens Arrays and the Test of Diffraction Efficiency[J]. Chinese Journal of Lasers, 1997, 24(1): 35.
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