光学学报, 1996, 16 (6): 833, 网络出版: 2006-12-04
二元光学元件制作误差分析与模拟
Fabrication Errors Analysis and Simulation of Binary Optical Element
二元光学元件 误差分析 计算机模拟 深度误差 对位误关 闪耀光栅 binary optical element error analysis computer simulation depth error alignment error blazed grating
摘要
从标量衍射理论出发,首先从理论上计算出多台阶二元光学元件发生深度误差时衍射效率的解析式;然后以4台阶和8台阶闪耀光栅为例,对二元光学元件套刻制作中的主要误差及其这些误差之间的相互影响进行了系统的分析和计算机模拟研究,模拟结果给实际制作提供了重要理论指导和实验参数。
Abstract
In this paper, the analytic expression of diffraction efficiency corresponding to the mask etch-depth errors is deduced from the scale diffraction theory. Choosing 4-step and 8-step blazed grating as an example, we simulated systematically main registeringetch errors and their interactions of binary optical element using computer. The results of computer simulation agree well with that of the analytic method. It can provide theoretical basis and experiment parameter for practical fabrication.
徐平, 张晓春, 郭履容, 郭永康, 周祥, 杜春雷, 周明宝. 二元光学元件制作误差分析与模拟[J]. 光学学报, 1996, 16(6): 833. 徐平, 张晓春, 郭履容, 郭永康, 周祥, 杜春雷, 周明宝. Fabrication Errors Analysis and Simulation of Binary Optical Element[J]. Acta Optica Sinica, 1996, 16(6): 833.
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