GaN-based p–i–n ultraviolet photodetectors with a thin p-type GaN layer on patterned sapphire substrates

Hongjuan Huang; Dawei Yan; Guosheng Wang; Feng Xie; Guofeng Yang; Shaoqing Xiao; Xiaofeng Gu

doi:doi:10.3788/col201412.092301

Chinese Optics Letters, 2014, 12 (9): 092301, Published Online: Aug. 21, 2014

GaN-based p–i–n ultraviolet photodetectors with a thin p-type GaN layer on patterned sapphire substrates Download： 785次

论文大纲

Hongjuan Huang ¹Dawei Yan ¹Guosheng Wang ²Feng Xie ²Guofeng Yang ¹Shaoqing Xiao ¹Xiaofeng Gu ¹

Author Affiliations

¹ Key Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, Jiangsu, China

² The 38th Research Institute of China Electronics Technology Group Corporation, Hefei 230088, China

230.0250 Optoelectronics 230.5160 Photodetectors 230.5440 Polarization-selective devices

Abstract

We study the performance of GaN-based p–i–n ultraviolet (UV) photodetectors (PDs) with a 60 nm thin p-type contact layer grown on patterned sapphire substrate (PSS). The PDs on PSS exhibit a low dark current of ~2 pA under a bias of -5 V, a large UV/visible rejection ratio of ~7×103, and a high-quantum efficiency of ~40% at 365 nm under zero bias. The average quantum efficiency of the PDs still remains above 20% in the deep-UV region from 280 to 360 nm. In addition, the noise characteristics of the PDs are also discussed, and the corresponding specific detectivities limited by the thermal noise and the low-frequency 1/f noise are calculated.

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Hongjuan Huang, Dawei Yan, Guosheng Wang, Feng Xie, Guofeng Yang, Shaoqing Xiao, Xiaofeng Gu. GaN-based p–i–n ultraviolet photodetectors with a thin p-type GaN layer on patterned sapphire substrates[J]. Chinese Optics Letters, 2014, 12(9): 092301.

GaN-based p–i–n ultraviolet photodetectors with a thin p-type GaN layer on patterned sapphire substrates Download： 785次

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