[1] 范瑞英,范正修.薄膜应力分析及一些测量结果[J].光学仪器,2001,23:84-91.
Fan R Y,Fan Z X.Stress analysis of thin films and some testing results.Optical Instruments,2001,23:84-91

[2] 劳技军,胡晓萍,虞晓江,等.AlN在AlN/VN纳米多层膜中的相转变及其对薄膜力学性能的影响[J].物理学报,2003,52:2259-2263.
Lao J J,Hu X P,Yu X J,et al.Phase transformation of AlN in AlN/VN nanomultilayers and its effect on the mechanical properties of films.Acta Physica Sinica,2003,52:2259-2263

[3] 方志军,夏义本,王林军,等.Al₂O₃ 陶瓷衬底碳离子预注入对金刚石薄膜应力的影响研究[J].物理学报,2003,52:1028-1033.
Fang Z J,Xia Y B,Wang L J,et al.Study of the stress observed in diamond films on carbon-implanted alumina surfaces.Acta Physica Sinica,2003,52:1028-1033

[4] 邵淑英,范正修,范瑞英,等.薄膜应力研究[J].激光与光电子学进展,2005,42:22-27.
Shao S Y,Fan Z X,Fan R Y,et al.A review of study of stress in thin films.Laser & Optoelectronics Progress,2005,42:22-27

[5] 向鹏,金春水,张立超,等.极紫外多层膜残余应力初步研究[J].强激光与粒子束,2005,17(3):377-380.
Xiang P,Jin C S,Zhang L C,et al.Control of residual stresss in extreme ultraviolet multilayer coatings.High Power Laser and Particle Beams,2005,17(3):377-380

[6] Callegari A,Cartier E,Gribelyuk M,et al.Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films[J].J Appl Phys,2001,90:6466-6475.

[7] 阎志军,王印月,徐闰,等.电子束蒸发制备HfO₂高k薄膜的结构特性[J].物理学报,2004,53:2271-2274.
Yan Z J,Wang Y Y,Xu R,et al.Structural characteristics of HfO₂ films grown by e-beam evaporation.Acta Physica Sinica,2004,53:2271-2274

[8] 马平,柴林,邱服民,等.制备工艺对HfO₂薄膜抗激光损伤能力的影响[J].强激光与粒子束,2001,13(1):31-33.
Ma P,Chai L,Qiu F M,et al.Influence of preparation processs on laser induced damage threshold of HfO₂ films.High Power Laser and Particle Beams,2001,13(1):31-33

[9] Alvisi M,Scaglione S,Martelli S,et al.Structural and optical modification in hafnium oxide thin films related to the momentum parameter transferred by ion beam assistance[J].Thin Solid Films,1999,354:19-23.

[10] Thielsch Roland,Gatto Alexandre,Kaiser Norbert.Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep-ultraviolet spectral region[J].App Opt,2002,41(16):3211-3217.

[11] Shao S Y,Fan Z X,Shao J D,et al.Evolutions of residual stress and microstructure in ZrO₂ thin films deposited at different temperatures and rates[J].Thin Solid Films,2003,445:59-62.

[12] Tamulevicius S.Stress and strain in the vacuum deposited thin films[J].Vacuum,1998,51(2):127-138.

[13] 李恒德,肖纪美.材料表面与界面[M].北京:清华大学出版社,1990.
Li H D,Xiao J M.Surface and Interface of Materials.Beijing:Tsinghua University Press,1990

[14] Macleod H A.Thin-film Optical Filters[M].London:Institute of Physics Publishing,1986.

[15] Sinha A K,Sheng T T.The temperature dependence of stress in aluminum films on oxidized silicon substrates[J].Thin Solid Films,1978,48(1):117-126.

[16] Blech I,Cohen U.Effects of humidity on stress in thin silicon dioxide films[J].J Appl Phys,1982,53(6):4202-4207.

[17] Leplan H,Geenen B,Pauleau Y.Residual stress in evaporated silicon dioxide thin films:Correlation with deposition parameters and aging behavior[J].J App Phys,1995,78(2):962-968.

[18] Leplan H,Robic J Y,Pauleau Y.Kinetics of residual stress evolution in evaporated silicon dioxide films exposed to room air[J].J Appl Phys,1996,79(9):6926-6931.