氧化锌薄膜的准分子激光退火热效应模拟分析 下载: 610次
[1] Nakajima T, Shinoda K, Tsuchiya T. UV-assisted nucleation and growth of oxide films from chemical solutions[J]. Chemical Society Reviews, 2014, 43(7): 2027-2041.
[2] Noh M, Seo I, Park J, et al. Spectroscopic ellipsometry investigation on the excimer laser annealed indium thin oxide sol-gel films[J]. Current Applied Physics, 2016, 16(2): 145-149.
[3] Shinoda K, Nakajima T, Tsuchiya T. In situ monitoring of excimer laser annealing of tin-doped indium oxide films for the development of a low-temperature fabrication process[J]. Applied Surface Science, 2014, 292 (15): 1052-1058.
[4] 黄立静, 任乃飞, 李保家, 等. 激光辐照对热退火金属/掺氟二氧化锡透明导电薄膜光电性能的影响[J]. 物理学报, 2015, 64(3): 034211.
Huang Lijing, Ren Naifei, Li Baojia, et al. Effects of laser irradiation on the photoelectric properties of thermal-annealed metal/fluorine-doped tin oxide transparent conductive films[J]. Acta Physica Sinica, 2015, 64(3): 034211.
[5] Charpentier C, Boukhicha R, Prod′homme P, et al. Evolution in morphological, optical, and electronic properties of ZnO∶Al thin films undergoing a laser annealing and etching process[J]. Solar Energy Materials and Solar Cells, 2014, 125(4): 223-232.
[6] Shao J Z, Fang X D, Wang X. Excimer laser annealing of ZnO films prepared by sputtering process[C]. SPIE, 2015, 9621: 96210E.
[7] 曾 勇, 赵 艳, 蒋毅坚. 不同气氛下ZnO薄膜的准分子激光辐照效应[J]. 中国激光, 2014, 41(2): 0207001.
[8] Johnson E V, Prod′homme P, Boniface C, et al. Excimer laser annealing and chemical texturing of ZnO∶Al sputtered at room temperature for photovoltaic applications[J]. Solar Energy Materials and Solar Cells, 2011, 95(10): 2823-2830.
[9] Huang L J, Li B J, Ren N F. Enhancing optical and electrical properties of Al-doped ZnO coated polyethylene terephthalate substrates by laser annealing using overlap rate controlling strategy[J]. Ceramics International, 2016, 42(6): 7246-7252.
[10] Nian Q, Zhang M Y, Schwartz B D, et al. Ultraviolet laser crystallized ZnO∶Al films on sapphire with high Hall mobility for simultaneous enhancement of conductivity and transparency[J]. Applied Physics Letters, 2014, 104(20): 201907.
[11] Wood R F, Giles G E. Macroscopic theory of pulsed-laser annealing. I. Thermal transport and melting[J]. Physical Review B, 1981, 23(6): 2923-2942.
[12] Duley W W. UV laser: Effects and applications in materials science[M]. Cambridge: Cambridge University Press, 1996: 100-101.
[13] Marla D, Barde V, Joshi S S. Analytical model to predict temperature distribution and ablation depth in excimer laser micromachining[J]. International Journal of Precision Engineering and Manufacturing, 2013, 14(1): 29-36.
[14] 华 亮, 田 威, 廖文和, 等. 激光熔覆热影响区及残余应力分布特性研究[J]. 激光与光电子学进展, 2014, 51(9): 091401.
[15] Adachi S. Handbook on physical properties of semiconductors[M]. New York: Kluwer Academic Publishers, 2004: 66-70.
[16] Craciun V, Elders J, Gardeniers J G E, et al. Characteristics of high quality ZnO thin films deposited by pulsed laser deposition[J]. Applied Physics Letters, 1994, 65(23): 2963-2965.
[17] Wang X, Shao J Z, Li H, et al. Analysis of damage threshold of K9 glass irradiated by 248-nm KrF excimer laser[J]. Optical Engineering, 2016, 55(2): 027102.
邵景珍, 王玺, 胡红涛, 方晓东. 氧化锌薄膜的准分子激光退火热效应模拟分析[J]. 激光与光电子学进展, 2017, 54(6): 061401. Shao Jingzhen, Wang Xi, Hu Hongtao, Fang Xiaodong. Thermal Effect Simulation Analysis on Excimer Laser Annealing of Zinc Oxide Thin Films[J]. Laser & Optoelectronics Progress, 2017, 54(6): 061401.