介绍了一种新颖的非零色散位移光纤结构设计方法及其MCVD+OVD制造工艺,所制备的光纤有效面积达到71 μm2以上。采用关键结构区域精确微扰方法,改进了光纤的色散特性,1550 nm处色散斜率由0.0715 ps/(nm2·km),分别减小至0.0605 ps/(nm2·km),0.0466 ps/(nm2·km),零色散波长由1500 nm附近移至1450 nm以下。测量表明,所得光纤具有优越的光学传输特性、抗弯曲性能和熔接性能,适用于C+L和S+C+L工作波长的大容量高速率长距离密集波分复用系统。光纤关键结构区域精确微扰是改进光纤性能的一种有效方法,该方法不限于MCVD工艺和非零色散位移光纤,对新型光纤的设计和生产具有积极的指导意义。

A novel design of non-zero dispersion-shifted fiber and its fabrication by MCVD+OVD process are presented. An effective-area of greater than 71 μm2 is obtained for the designed fiber. Dispersion characteristics is improved by reducing 1550 nm dispersion slope from 0.0715 ps/(nm2·km) to 0.0605 ps/(nm2·km)or 0.0466 ps/(nm2·km),while zero dispersion wavelength was shifted from 1500 nm to 1450 nm. Experimental measurement indicates that the fabricated fiber has an excellent optical transmission property with a excellent macro-bending and splice performance,suitable for high-speed long haul dense wavelength division multiplexing systems in C+L or S+C+L bands. This innovative design procedure utilizes accurate perturbation algorithm for fine adjustment of key-part of fiber configuration,the method is not limited to MCVD process and non-zero dispersion-shifted fibers,but also can be applied for the development of specialty fibers.