中国激光, 1983, 10 (12): 858, 网络出版: 2012-08-31
激光预热基片化学气相沉积硅薄膜
摘要
Abstract
Silane was deposited into silicon films on the substrates by first preheating the quartz substrates with laser, and then admitting the hybrid of silane gas and H3 gas into the reaction chamber. The thickness of the film center was found to be 2um with an area of 10.5 mm2.
陈万湘, 王入更, 薛春银, 王玉琪. 激光预热基片化学气相沉积硅薄膜[J]. 中国激光, 1983, 10(12): 858. 陈万湘, 王入更, 薛春银, 王玉琪. [J]. Chinese Journal of Lasers, 1983, 10(12): 858.
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