基于空间像自适应降噪的投影物镜波像差检测方法
杨济硕, 李思坤, 王向朝, 闫观勇, 徐东波. 基于空间像自适应降噪的投影物镜波像差检测方法[J]. 光学学报, 2013, 33(1): 0111003.
Yang Jishuo, Li Sikun, Wang Xiangzhao, Yan Guanyong, Xu Dongbo. Projection Lens Wave-Front Aberration Measurement Method Based on Adaptive Aerial Image Denoising[J]. Acta Optica Sinica, 2013, 33(1): 0111003.
[1] A. Erdmann, M. Arnz. The impact of aberration averaging during step-and-scan on the photolithographic process[J] . Microelectron. Eng., 1998, 41(42): 117~120
[2] 马明英, 王向朝, 王帆 等. 基于套刻误差测试标记的彗差检测技术[J]. 光学学报, 2006, 26(7): 1037~1042
[3] P. Graeupner, R. B. Garreis, A. Goehnermeier et al.. Impact of wavefront errors on low kl processes at extremely high NA[C]. SPIE, 2003, 5040: 119~130
[4] 王帆, 王向朝, 马明英 等. 基于双线空间像线宽不对称度的彗差测量技术[J]. 光学学报, 2006, 26(5): 673~678
[5] B. Peng, X. Wang, Z. Qiu et al.. Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging[J]. Opt. Lett., 2010, 35(9): 1404~1406
[6] H. van der Laan, M. Dierichs, H. van Greevenbroek et al.. Aerial image measurement methods for fast aberration set-up and illumination pupil verification[C]. SPIE, 2001, 4346: 394~407
[7] Z. Qiu, X. Wang, Q. Yuan et al.. Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width[J]. Appl. Opt., 2009, 48(2): 261~269
[8] T. Hagiwara, N. Kondo, I. Hiroshi et al.. Development of aerial image based aberration measurement technique[C]. SPIE, 2005, 5754: 1659~1669
[9] W. Liu, S. Liu, T. Zhou et al.. Aerial image based technique for measurement of lens aberrations up to 37th Zernike coefficient in lithographic tools under partial coherent illumination[J]. Opt. Express, 2009, 17(21): 19278~19291
[10] R. Miyakawa, P. Naulleau. Aerial image monitor for wavefront metrology of high-resolution EUV lithography tools[C]. SPIE, 2012, 8322(18): 1~7
[11] L. Duan, X. Wang, A. Bourov et al.. In situ aberration measurement technique based on principal component analysis of aerial image[J]. Opt. Express, 2011, 19(19): 18080~18090
[12] L. Duan, X. Wang, G. Yan et al.. Practical application of AMAI-PCA to measure wavefront aberration of lithographic lens[J]. J. Micro/Nanolithography, MEMS, and MOEMS (JM3), 2012, 11(2): 023009
[13] J. O. Rawlings, S. G. Pantula, D. A. Dickey. Applied Regression Analysis: A Research Tool[M]. New York: Springer-Verlag Press, 2nd ed. 1998. 411~417
[14] R. C. Gonzalez, R. E. Woods. Digital Image Processing[M]. New Jersey: Prentice Hall Press, 3rd ed. 2008. 93~97
[15] G. Box, D. Behnken. Some new three level designs for the study of quantitative variables[J]. Technometrics, 1960, 2(4): 455~475
[16] KLA-Tencor. Software package Prolith v8.0.3
[17] I. T. Jolliffe. Principal Component Analysis[M]. New York: Springer Press, 2nd ed. 2002. 150~165
杨济硕, 李思坤, 王向朝, 闫观勇, 徐东波. 基于空间像自适应降噪的投影物镜波像差检测方法[J]. 光学学报, 2013, 33(1): 0111003. Yang Jishuo, Li Sikun, Wang Xiangzhao, Yan Guanyong, Xu Dongbo. Projection Lens Wave-Front Aberration Measurement Method Based on Adaptive Aerial Image Denoising[J]. Acta Optica Sinica, 2013, 33(1): 0111003.