Organosilicone composite antireflective (AR) coating was successfully prepared for Ti-sapphire crystals by sol-gel process from precursors of tetraethoxysilane [Si(OC2H5)4, TEOS] and methyltriethoxysilane [CH3Si(OC2H5)3, MTEOS]. This AR coating possessed prominent AR effect within the output waveband (750～850 nm) of Ti-sapphire laser with average transmission above 98.6%, and its surface homogeneity met the requirements of the laser wavefront. The laser induced damage threshold (LIDT) of 2.2 J/cm2 was obtained at 800 nm with the pulse duration of 300 ps for this AR coating on Ti-sapphire crystals, which made it suitable for the optics of ultrashort pulse pico- and femtosecond high power lasers. Further, investigations on the performance of coating solution showed that the viscosity and coating refractive index both increased along with MTEOS prepolymer content, and effect of bake temperature on the latter was very small.

以硅酸四乙酯(TEOS)和甲基三乙氧基硅烷(MTEOS)为前驱材料,用溶胶-凝胶(sol-gel)方法在钛宝石表面制备得到均匀性良好且具有高激光损伤阈值的有机硅复合凝胶增透膜。膜层在钛宝石激光器输出波段(750～850 nm)的增透效果显著,其平均透过率超过98.6%;激光破坏阈值为2.2 J/cm2(800 nm,300 ps);膜层表面均匀性达到激光波面的要求,在皮秒、飞秒超短脉冲高功率激光领域具有应用价值。溶胶的性能测试结果表明,溶胶粘度和成膜折射率均随溶液中CH3SiO1.5溶胶体含量的增加而增大,而膜层折射率受烘烤温度影响较小。

type of λ/4～λ/2 broadband antireflective coating has been developed by sol-gel dipping method with tetrabutylorthotitanate and tetraethoxysilane (TEOS) as precursors. This antireflective coating possesses smooth and even surface,its average roughness is estimated having the value of RMS (1.201) and RA (0.934),and the specific scratch-resistant is good. Most -OH groups are eliminated at the temperature near 200 ℃. The average transmission of both-coated K9 substrate is increased 6.6% higher than uncoated one in the spectra from 400 nm to 700 nm. The antireflective coating is expected to coat amplifier blastshields of "Sheng-Guang: facility for enhancing the pumping efficiency of amplifiers

以钛酸正丁酯[Ti(OBu)4]、正硅酸乙酯(TEOS)为原料,采用溶胶-凝胶(sol-gel)提拉方法在K9光学玻璃基片上镀制得高透过的λ/4～λ/2型宽带增透膜.该增透膜的表面均匀性良好,均方根粗糙度(RMS)为1.201,平均粗糙度(RA)为0.934,具有一定的耐擦除性.经200 ℃热处理,膜层中的OH吸收峰已基本消失,在400～700 nm光谱范围的透过率比基片的平均透过率提高6.6%.为实现大面积涂覆"神光"装置主放大器的防爆隔板玻璃,大幅度提高主放大器的抽运效率奠定基础.

磷酸二氢钾(KDP)晶体是为惯性约束聚变提供短波长的必不可少的谐波转换光学元件.大气中潮气会使水溶性生长的KDP晶体光学表面受潮发雾、降低光束的透过率、破坏光束的质量.用玻璃树脂制备KDP晶体防潮保护膜可使之具有良好的光学性质和高的激光破坏阈值,这是目前各大实验室关心的技术.……