为提高稀土掺杂TiO2薄膜的上转换效率，采用溶胶-凝胶法和旋涂镀膜工艺制备了Yb3+-Er3+共掺杂SiO2/TiO2上转换光致发光薄膜，研究了SiO2对TiO2薄膜形貌以及发光性能的影响。利用FE-SEM观察了薄膜的表面形貌，利用分光光度计测试了薄膜在近红外光区域的透射率的变化，并用荧光光谱仪测试了薄膜的上转换发光光谱。结果表明：SiO2的掺杂导致TiO2颗粒尺寸显著减小，TiO2薄膜在近红外的透射率也有所下降。在980 nm红外光激发下，SiO2/TiO2薄膜在630~670 nm处获得了明显的上转换红光发射，在516~537 nm和537~570 nm处获得了较弱的上转换绿光发射。由上转换发光强度与激光泵浦功率的关系推知，绿色和红色上转换发光均为双光子吸收发射过程。

利用传输矩阵法设计了由SiO2、TiO2组成的多层膜高透射率光子晶体结构，并分析了其透射谱特性，根据等效层原理改变多层膜一维光子晶体的自身结构来提高通带内特征波长附近的透射率，获得了最佳结构参数。研究结果表明，当晶格参数为150 nm，填充比为0.346，周期数为6时，400 nm波长附近吸收带处的透射率最低也可达96.5%，并且不论是TM模式还是TE模式，入射角在0°~45°范围内仍保持高的透射率，该结构可望用于空气净化装置以提高SiO2、TiO2光催化剂的光催化效率。

SiO2-TiO2 sol-gel films are deposited on SiO2/Si by dip-coating technique. The SiO2-TiO2 strips are fabricated by laser direct writing using an ytterbium fiber laser and followed by chemical etching. Surface structures, morphologies and roughness of the films and strips are characterized. The experimental results demonstrate that the SiO2-TiO2 sol-gel film is loose in structure and a shrinkage concave groove forms if the film is irradiated by laser beam. The surface roughness of both non-irradiated and laser irradiated areas increases with the chemical etching time. But the roughness of laser irradiated area increases more than that of non-irradiated area under the same etching time. After being etched for 28 s, the surface roughness value of the laser irradiated area increases from 0.3 nm to 3.1 nm.