Author Affiliations
Abstract
1 Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China
2 Beijing Research Institute of Telemetry, Beijing 100094, China
The influence of nodule defects on the characteristics of femtosecond laser-induced damage has not been fully investigated. In this study, two types of 800 nm/1064 nm dual-band HfO2/SiO2 high-reflection films with different configurations were analyzed. Combined with finite-difference time-domain electric field simulation and focused ion beam analysis, the initial state and growth process of femtosecond laser damage of nodules were explored. In particular, the sequence of blister damage determined by the film design and the inner damage caused by nodules were clarified. The rule of the laser-induced damage threshold of different size nodules was obtained. The difference in the damage behavior of nodules in the two types of films was elucidated.
femtosecond laser damage nodule defects dual-band high reflectors 
Chinese Optics Letters
2021, 19(8): 081403
作者单位
摘要
四川大学 电子信息学院, 四川 成都 610065
在高功率激光系统中, 光学薄膜元件表面杂质和体内节瘤缺陷是导致薄膜元件损伤的关键因素。通过建立强激光连续辐照下光学薄膜元件的热分析模型, 分析在不同激光辐照时间和功率密度下, 表面杂质和节瘤缺陷对光学薄膜元件损伤的影响及其规律。结果表明, 在强激光连续辐照下, 当表面杂质粒子尺寸处于一定范围内时, 随着杂质粒子尺寸的增大, 薄膜元件上的最高温度随之升高, 且大而浅的节瘤缺陷种子对膜层的温升影响较大。随着激光功率密度的提高和激光辐照时间的增长, 表面杂质造成薄膜元件热熔融损伤的粒子尺寸范围越大, 节瘤缺陷造成薄膜元件热熔融损伤的种子深度和尺寸范围也越大。
激光 表面杂质 节瘤缺陷 薄膜元件 热熔融 laser surface impurities nodule defects thin film components thermal melting damage 
红外与激光工程
2018, 47(12): 1243003

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