为了进一步探索用绝缘体上晶体硅制作的浅刻蚀脊形波导侧向泄漏损耗的规律, 提出并研究了一种非矩形截面浅刻蚀绝缘体上晶体硅脊形波导.用光的干涉理论建立该波导的周期性损耗模型并推导出损耗周期公式, 然后通过完美匹配层边界条件下的频域有限元法仿真观察该特殊波导类TM0模的侧向泄漏损耗周期的变化与最大损耗点的偏移现象.周期大小的仿真结果与理论计算符合度较高, 其平均相对误差仅0.56％.此外, 发现该类波导在某些沟槽宽度下可以通过改变截面来实现对类TM0模损耗从最大到最小的调节, 而在另外一些沟槽宽度下, 类TM0模损耗对截面变化不敏感.研究结果可以简化波导加工并提高制作容差, 为该类型波导的设计与制作提供参考.
导波光学 浅刻蚀脊形波导 绝缘体上晶体硅 泄漏波 光损耗 Guidewave optics shallowly-etched ridge waveguides silicon-on-insulator leaky wave optical losses
Author Affiliations
Abstract
1 Key Laboratory of Material Science and Technology for High Power Lasers, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
2 Graduate University of Chinese Academy of Sciences, Beijing 100049, China
A new design of shallow-etched multilayer dielectric grating (MDG) exhibiting a diffraction efficiency (DE) of approximately 100% in the –1st order at 1064-nm wavelength in Littrow mounting is reported. Particle swarm optimization algorithm and Fourier modal method are used to design MDG and calculate the DE of MDG. The thickness of the grating layer is less than 80 nm which is much shallower than that in the currently reported MDG design for a high DE, which is greatly helpful for the MDG etching process. Meanwhile, the bandwidth of DE which is more than 97.5% of MDG is 60 nm, and it is a meaningful result for MDG to be used in ultrashort pulse compression system.
多层介质膜光栅 浅刻蚀 粒子群优化算法 傅里叶模式方法 050.0050 Diffraction and gratings 050.1940 Diffraction 050.1950 Diffraction gratings 050.2770 Gratings 310.0310 Thin films Chinese Optics Letters
2010, 8(s1): 29
