氧化铪是高激光损伤阈值薄膜领域内一种重要的高折射率材料，其禁带宽度和Urbach带尾宽度直接影响到薄膜的吸收和激光损伤阈值。针对离子束溅射沉积法制备的氧化铪薄膜，以基板温度、离子束电压、离子束电流和氧气流量为主要制备参数，提出了基于正交实验的光学带隙调整方法，并采用Cody-Lorentz介电常数模型表征了薄膜的禁带宽度和带尾宽度。研究结果表明，当置信概率为90%时，在影响氧化铪薄膜禁带宽度的制备因素中，影响权重从大到小依次为基板温度、离子束电流和氧气流量，采用低基板温度、中等离子束电流和低氧气流量制备参数组合，可以获得高禁带宽度的氧化铪薄膜；对带尾宽度影响最大的制备参数是基板温度，其他参数影响不显著，在高基板温度下可以获得较低的带尾宽度，这表明氧化铪薄膜的无序度较低。

HfO2 is used as one of the most important high refractive index materials in the field of high laser damage threshold thin films. The band gap and the Urbach energy impact absorption and laser damage threshold directly. The HfO2 thin film is prepared by ion beam sputtering, and the technical parameters include the substrate temperature, the ion beam voltage, the ion beam current and the oxygen flow rate. The adjustment method for the optical gap is proposed based on the orthogonal experiment, and the Cody-Lorentz dielectric model is used to characterize the band gap and the Urbach energy. The results show that, when the confidence probability is 90%, the most influential preparative parameters for the band gap of the HfO2 thin film are listed as the substrate temperature, the ion beam current, and the oxygen flow rate. The wider band gap of the HfO2 can be obtained by the combination of the lower substrate temperature, the moderate ion beam current, and the lower oxygen flow rate. The Urbach energy is influenced mostly by the substrate temperature, and other parameters have no notable influence. The lower Urbach energy can be obtained at the higher substrate temperature, which indicates that the HfO2 thin film has lower degree of disorder.