NiC/Ti中子超镜是一种高性能的中子多层膜光学元件,NiC纳米薄膜的制作是实现NiC/Ti多层膜的关键技术。基于Ni和C的直流磁控溅射方法,提出了一种NiC联合溅射靶材的实现方法,并制作了NiC单层膜样品。X射线光电子能谱的测量结果表明:用联合溅射靶材制作的NiC薄膜中Ni和C的原子数比与理论预期相吻合;基于X射线光电子能谱测试得到的Ni、C原子数比,通过构建Ni86C14的模型,可以很好地对掠入射X射线反射测试结果进行理论拟合。该研究可为进一步开展NiC/Ti中子超镜的制作提供参考。

NiC/Ti neutron supermirror as a kind of multilayered optical elements presents high-performance.The manufactured technique of NiC nano-meter films is extremely important to realize the fabrication of NiC/Ti multilayers.Based on the direct current magnetron sputtered technique of Ni and C,a co-sputtering technique is reported in this paper.The NiC monolayer was fabricated from NiC target successfully.The measured result of X-ray photoelectron spectroscopy(XPS) indicates that the atomic ratio of Ni and C from NiC layer made by NiC target agrees with the theoretical expected result.The Ni86C14 model based on the atomic ratio measured by XPS was used to fit the curve measured by grazing incidence X-ray reflectivity.The fitted curve is in generally consistent with the measured result.This investigation can give direction to develop the fabricated technique of NiC/Ti neutron supermirror.