激光与光电子学进展, 2009, 46 (6): 49, 网络出版: 2009-06-18
脉冲激光沉积法制备二氧化钒薄膜的研究进展
Research Progress of Vanadium Dioxide Thin Film Fabricated by Pulsed Laser Deposition
摘要
主要阐述了脉冲激光沉积(PLD)技术在制备金属氧化物方面的物理过程和技术特点, 详细介绍了脉冲激光沉积制备二氧化钒(VO2)薄膜的工艺参数和国内外研究进展, 并与几种常规制备方法进行了对比, 给出了脉冲激光沉积掺杂对VO2薄膜特性的影响, 以及脉冲激光沉积制备VO2纳米材料, 讨论了脉冲激光沉积制备VO2薄膜存在的问题和发展方向。
Abstract
Physical processes and technical characteristics of pusled laser deposition(PLD) in the preparation of metal oxide are mainly described, and process parameters and research progress at home and abroad in the fabrication of vanadium dioxide(VO2) thin film are presented. Based on the contrasts with traditional fabrication methods, the preparation of VO2 nano-material and the effect of doping by pulsed laser deposition on the properties of VO2 thin film are proposed. The problems and future of VO2 thin film fabricated by pusled laser depostion are discussed.
王海方, 李毅, 蒋群杰, 俞晓静, 胡双双, 武斌, 张虎, 黄毅泽, 张伟. 脉冲激光沉积法制备二氧化钒薄膜的研究进展[J]. 激光与光电子学进展, 2009, 46(6): 49. Wang Haifang, Li Yi, Jiang Qunjie, Yu Xiaojing, Hu Shuangshuang, Wu Bin, Zhang Hu, Huang Yize, Zhang Wei. Research Progress of Vanadium Dioxide Thin Film Fabricated by Pulsed Laser Deposition[J]. Laser & Optoelectronics Progress, 2009, 46(6): 49.
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