脉冲激光沉积法制备二氧化钒薄膜的研究进展
[1] . F. Haglund Jr. Synthesis of vanadium dioxide thin films and nanoparticles[J]. J. Phys.: Condens. Matter, 2008, 20: 1-16.
[2] Troy D. Manning,Ivan P. Parkin. Intelligent window coatings: Atmospheric pressure chemical vapor deposition of tungsten-doped vanadium dioxide[J]. Chem. Mater.2004,16: 744~749
[3] . . Optical properties of vanadium dioxide film during semiconductive-metallic phase transition[J]. Japanese Journal of Applied Physics, 2007, 46(5): 113-116.
[4] . 用于微测辐射热探测器的纳米VO2薄膜[J]. 材料研究学报, 2007, 21(6): 609-612.
[5] 王宏臣,易新建,陈四海 等. 氧化钒薄膜的制备及其光电特性研究[J]. 中国激光, 2003, 30(12): 1107~1110
[6] . PLD技术在功能薄膜材料研究中的应用[J]. 中国水运, 2007, 5(12): 44-45.
[7] . 脉冲激光薄膜制备技术[J]. 真空与低温, 2000, 6(2): 63-70.
[8] . K., Narayan J.. Pulsed-laser evaporation technique for deposition of thin films: physics and theoretical model[J]. Phys. Rev. B, 1990, 41(13): 8843-8859.
[9] . 脉冲激光沉积( PLD)技术及其应用研究[J]. 空军工程大学学报(自然科学版), 2005, 6(3): 79-81.
[10] 蒋群杰,李 毅,胡双双 等. 基于热光效应的智能窗薄膜材料[J]. 激光与光电子学进展, 2007, 44(22): 45~51
[11] 纠智先,李 强. 沉积温度对制备ZnS薄膜的影响[J]. 武汉工业学院学报, 2008, (02): 45~47
[12] 蔡 虎,陈清明,程祖海. 背景气体对强激光与固体物质作用的影响研究进展[J]. 激光与光电子学进展, 2004,41(8): 2~5
[13] . H., Kwok H. S.. Pulsed laser deposition of VO2 thin films[J]. Appl. Phys. Lett., 1994, 5(31): 88-90.
[14] M. Soltani, M. Chaker. Optical switching of vanadium dioxide thin films deposited by reactive pulsed laser deposition [J]. J. Vac. Sci. Technol., 2004, A22(3): 859~864
[15] . Better thermocholmc glazing of windows with anti-reflection coating[J]. Thin Solid Films, 2004, 365: 5-6.
[16] . J.,Scherber W.. New sputer process for VO2 thin films and examination with MIS-elemants and C-V- measurements.[J]. Thin Solid Films, 2000, 366: 199.
[17] . . Preparation of optical quality ZnCdTe thin films by vacuum evaporation[J]. Appl. Opt., 1998, 37(13): 2681-2686.
[18] . VO2薄膜的主要制备工艺参数研究[J]. 功能材料, 1997, 29: 52-55.
[19] . ,Harizanova A., Surtchev M. et al.. Investigation of sol-gel derived thin films of titanium dioxide doped with vanadium oxide[J]. Solar Energy Materials&Solar Cells, 2003, 76: 591-598.
[20] Dachuan Y., Niankan X., Jingyu Z. et al.. High quality vanadium dioxide films prepared by all inorganic sol-gel method [J]. Mater. Res. Bull., 1996, 3l: 335~340
[21] . 二氧化钒粉末制备工艺研究的现状和发展趋势[J]. 钢铁钒钛, 2003, 24(2): 61-64.
[22] . , Qian F., Nagabushnam V. et al.. Pulsed-laser deposition of oriented VO2 thin films on R-cut sapphire substrates[J]. Appl. Phys. Lett., 1993, 3(32): 88-90.
[23] . , Bouziane K., Maritz J. et al.. Direct production of thermochromic VO2 thin film coatings by pulsed laser ablation[J]. Opt. Mater., 2000, 5(4): 1-5.
[24] 敖育红, 胡少六, 龙 华 等. 脉冲激光沉积薄膜技术研究新进展[J]. 激光技术,2003, 27(5): 453~457
[25] . B.. Undoped and doped VO2 films grown from VO(OC3H7)3[J]. Thin Solid Films, 1983, 110: 73-82.
[26] . V., Lee J. C.. Doped vanadium oxide for optical switching films Sol[J]. Energy Mater., 1986, 14: 205-214.
[27] . 无机溶胶凝胶法制备掺钨二氧化钒薄膜研究[J]. 钢铁钒钛, 2007, 28(3): 33-36.
[28] . 掺钨二氧化钒薄膜的制备与分析[J]. 真空与低温, 2004, 10(2): 85-88.
[29] . Jin, M. Tazawa, K. Yoshimura et al.. Epitaxial growth of W-doped VO2/V2O3 multilayer on α-Al2O3(110) by reactive magnetron sputtering[J]. Thin Solid Films, 2000, 375: 128-131.
[30] M. Soltani, M. Chaker. Thermochromic vanadium dioxide smart coatings grown on Kapton substrates by reactive pulsed laser deposition[J]. J. Vac. Sci. Technol., 2006, A 24(3): 612~617
[31] . , Suh J. Y., Feldman L. C. et al.. Size-dependent optical properties of VO2 nanoparticle arrays[J]. Phys. Rev. Lett., 2004, 93(17): 177403.
[32] . Y., Lopez R., Feldman L. C. et al.. Semiconductor to metal phase transition in the nucleation and growth of VO2 nanoparticles and thin films[J]. Appl. Phys., 2004, 96(2): 1209-1213.
[33] . A., Herger R., Willmott P. R. et al.. X-ray diffraction studies of the growth of vanadium dioxide nanoparticles[J]. Appl. Phys., 2007, 102(07): 3527.
王海方, 李毅, 蒋群杰, 俞晓静, 胡双双, 武斌, 张虎, 黄毅泽, 张伟. 脉冲激光沉积法制备二氧化钒薄膜的研究进展[J]. 激光与光电子学进展, 2009, 46(6): 49. Wang Haifang, Li Yi, Jiang Qunjie, Yu Xiaojing, Hu Shuangshuang, Wu Bin, Zhang Hu, Huang Yize, Zhang Wei. Research Progress of Vanadium Dioxide Thin Film Fabricated by Pulsed Laser Deposition[J]. Laser & Optoelectronics Progress, 2009, 46(6): 49.