激光与光电子学进展, 2009, 46 (6): 49, 网络出版: 2009-06-18   

脉冲激光沉积法制备二氧化钒薄膜的研究进展

Research Progress of Vanadium Dioxide Thin Film Fabricated by Pulsed Laser Deposition
作者单位
1 上海理工大学 光学与电子信息工程学院, 上海 200093
2 上海理工大学 上海市现代光学系统重点实验室, 上海 200093
摘要
主要阐述了脉冲激光沉积(PLD)技术在制备金属氧化物方面的物理过程和技术特点, 详细介绍了脉冲激光沉积制备二氧化钒(VO2)薄膜的工艺参数和国内外研究进展, 并与几种常规制备方法进行了对比, 给出了脉冲激光沉积掺杂对VO2薄膜特性的影响, 以及脉冲激光沉积制备VO2纳米材料, 讨论了脉冲激光沉积制备VO2薄膜存在的问题和发展方向。
Abstract
Physical processes and technical characteristics of pusled laser deposition(PLD) in the preparation of metal oxide are mainly described, and process parameters and research progress at home and abroad in the fabrication of vanadium dioxide(VO2) thin film are presented. Based on the contrasts with traditional fabrication methods, the preparation of VO2 nano-material and the effect of doping by pulsed laser deposition on the properties of VO2 thin film are proposed. The problems and future of VO2 thin film fabricated by pusled laser depostion are discussed.
参考文献

[1] . F. Haglund Jr. Synthesis of vanadium dioxide thin films and nanoparticles[J]. J. Phys.: Condens. Matter, 2008, 20: 1-16.

[2] Troy D. Manning,Ivan P. Parkin. Intelligent window coatings: Atmospheric pressure chemical vapor deposition of tungsten-doped vanadium dioxide[J]. Chem. Mater.2004,16: 744~749

[3] . . Optical properties of vanadium dioxide film during semiconductive-metallic phase transition[J]. Japanese Journal of Applied Physics, 2007, 46(5): 113-116.

[4] . 用于微测辐射热探测器的纳米VO2薄膜[J]. 材料研究学报, 2007, 21(6): 609-612.

[5] 王宏臣,易新建,陈四海 等. 氧化钒薄膜的制备及其光电特性研究[J]. 中国激光, 2003, 30(12): 1107~1110

[6] . PLD技术在功能薄膜材料研究中的应用[J]. 中国水运, 2007, 5(12): 44-45.

[7] . 脉冲激光薄膜制备技术[J]. 真空与低温, 2000, 6(2): 63-70.

[8] . K., Narayan J.. Pulsed-laser evaporation technique for deposition of thin films: physics and theoretical model[J]. Phys. Rev. B, 1990, 41(13): 8843-8859.

[9] . 脉冲激光沉积( PLD)技术及其应用研究[J]. 空军工程大学学报(自然科学版), 2005, 6(3): 79-81.

[10] 蒋群杰,李 毅,胡双双 等. 基于热光效应的智能窗薄膜材料[J]. 激光与光电子学进展, 2007, 44(22): 45~51

[11] 纠智先,李 强. 沉积温度对制备ZnS薄膜的影响[J]. 武汉工业学院学报, 2008, (02): 45~47

[12] 蔡 虎,陈清明,程祖海. 背景气体对强激光与固体物质作用的影响研究进展[J]. 激光与光电子学进展, 2004,41(8): 2~5

[13] . H., Kwok H. S.. Pulsed laser deposition of VO2 thin films[J]. Appl. Phys. Lett., 1994, 5(31): 88-90.

[14] M. Soltani, M. Chaker. Optical switching of vanadium dioxide thin films deposited by reactive pulsed laser deposition [J]. J. Vac. Sci. Technol., 2004, A22(3): 859~864

[15] . Better thermocholmc glazing of windows with anti-reflection coating[J]. Thin Solid Films, 2004, 365: 5-6.

[16] . J.,Scherber W.. New sputer process for VO2 thin films and examination with MIS-elemants and C-V- measurements.[J]. Thin Solid Films, 2000, 366: 199.

[17] . . Preparation of optical quality ZnCdTe thin films by vacuum evaporation[J]. Appl. Opt., 1998, 37(13): 2681-2686.

[18] . VO2薄膜的主要制备工艺参数研究[J]. 功能材料, 1997, 29: 52-55.

[19] . ,Harizanova A., Surtchev M. et al.. Investigation of sol-gel derived thin films of titanium dioxide doped with vanadium oxide[J]. Solar Energy Materials&Solar Cells, 2003, 76: 591-598.

[20] Dachuan Y., Niankan X., Jingyu Z. et al.. High quality vanadium dioxide films prepared by all inorganic sol-gel method [J]. Mater. Res. Bull., 1996, 3l: 335~340

[21] . 二氧化钒粉末制备工艺研究的现状和发展趋势[J]. 钢铁钒钛, 2003, 24(2): 61-64.

[22] . , Qian F., Nagabushnam V. et al.. Pulsed-laser deposition of oriented VO2 thin films on R-cut sapphire substrates[J]. Appl. Phys. Lett., 1993, 3(32): 88-90.

[23] . , Bouziane K., Maritz J. et al.. Direct production of thermochromic VO2 thin film coatings by pulsed laser ablation[J]. Opt. Mater., 2000, 5(4): 1-5.

[24] 敖育红, 胡少六, 龙 华 等. 脉冲激光沉积薄膜技术研究新进展[J]. 激光技术,2003, 27(5): 453~457

[25] . B.. Undoped and doped VO2 films grown from VO(OC3H7)3[J]. Thin Solid Films, 1983, 110: 73-82.

[26] . V., Lee J. C.. Doped vanadium oxide for optical switching films Sol[J]. Energy Mater., 1986, 14: 205-214.

[27] . 无机溶胶凝胶法制备掺钨二氧化钒薄膜研究[J]. 钢铁钒钛, 2007, 28(3): 33-36.

[28] . 掺钨二氧化钒薄膜的制备与分析[J]. 真空与低温, 2004, 10(2): 85-88.

[29] . Jin, M. Tazawa, K. Yoshimura et al.. Epitaxial growth of W-doped VO2/V2O3 multilayer on α-Al2O3(110) by reactive magnetron sputtering[J]. Thin Solid Films, 2000, 375: 128-131.

[30] M. Soltani, M. Chaker. Thermochromic vanadium dioxide smart coatings grown on Kapton substrates by reactive pulsed laser deposition[J]. J. Vac. Sci. Technol., 2006, A 24(3): 612~617

[31] . , Suh J. Y., Feldman L. C. et al.. Size-dependent optical properties of VO2 nanoparticle arrays[J]. Phys. Rev. Lett., 2004, 93(17): 177403.

[32] . Y., Lopez R., Feldman L. C. et al.. Semiconductor to metal phase transition in the nucleation and growth of VO2 nanoparticles and thin films[J]. Appl. Phys., 2004, 96(2): 1209-1213.

[33] . A., Herger R., Willmott P. R. et al.. X-ray diffraction studies of the growth of vanadium dioxide nanoparticles[J]. Appl. Phys., 2007, 102(07): 3527.

王海方, 李毅, 蒋群杰, 俞晓静, 胡双双, 武斌, 张虎, 黄毅泽, 张伟. 脉冲激光沉积法制备二氧化钒薄膜的研究进展[J]. 激光与光电子学进展, 2009, 46(6): 49. Wang Haifang, Li Yi, Jiang Qunjie, Yu Xiaojing, Hu Shuangshuang, Wu Bin, Zhang Hu, Huang Yize, Zhang Wei. Research Progress of Vanadium Dioxide Thin Film Fabricated by Pulsed Laser Deposition[J]. Laser & Optoelectronics Progress, 2009, 46(6): 49.

本文已被 2 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!