光子学报, 2010, 39 (2): 296, 网络出版: 2010-05-24
不同衬底温度下PLD法制备的氧化锌薄膜的特性
Properties of ZnO Thin Films with Effect of Substrate Temperature by PLD
摘要
利用GCR-170型脉冲激光器 Nd：YAG的三次谐波(355 nm)，以蓝宝石Al2O3 (0001)为衬底，在不同温度下采用脉冲激光沉积法制备了ZnO薄膜.通过原子力显微镜、Raman谱、光致发光谱、红外透射谱、霍尔效应和表面粗糙度分析仪对制备的ZnO薄膜进行了测试.分析了在不同衬底温度下薄膜的表面形貌、光学特性，同时进行了薄膜结构和厚度的测试.研究表明：衬底温度对ZnO薄膜的表面形貌、光学特性、结构特性都是重要的工艺参量，尤其在500 ℃时沉积的ZnO薄膜致密均匀，并表现出较强的紫外发射峰.
Abstract
ZnO thin films are deposited on sapphire (0001) substrates by a high-purity ZnO target and a pulsed Nd:YAG laser with a wavelength of 355 nm.The structural,optical and electrical properties of ZnO thin films are grown and investigated in various substrate temperatures.The morphological propertie of the films is analyzed by atomic force microscopy (AFM).The optical properties and electrical properties of the films are investigated by Raman scattering and ultraviolet photoluminescence (PL) emission and FTIR Hall-effect measurements,respectively.The results of the temperature of the substrate is a highly important parameter to influence the film morphology and films grown,and the high quality crystallinity has an excellent UV emission at 500 ℃.
苏雪琼, 王丽, 陈江博, 孔乐, 刘红梅, 张新平. 不同衬底温度下PLD法制备的氧化锌薄膜的特性[J]. 光子学报, 2010, 39(2): 296. SU Xue-qiong, WANG Li, CHEN Jiang-bo, KONG Le, LIU Hong-mei, ZHANG Xin-ping. Properties of ZnO Thin Films with Effect of Substrate Temperature by PLD[J]. ACTA PHOTONICA SINICA, 2010, 39(2): 296.
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