强激光与粒子束, 2011, 23 (5): 1299, 网络出版: 2011-05-27
在19.5 nm处高反在30.4 nm处抑制的双功能薄膜
Dual-functional multilayer for high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm
双功能 多层膜 极紫外 直流磁控溅射 同步辐射 dual-functional multilayer extreme ultraviolet direct current magnetron sputtering synchrotron radiation
摘要
研究了极紫外波段的双功能光学元件。采用周期膜叠加的思想, 运用遗传方法优化设计了在19.5 nm处高反, 在30.4 nm处抑制的双功能多层膜。采用磁控溅射技术制备了多层膜, 利用X射线衍射仪测试了多层膜的结构, 在国家同步辐射实验室测试了双功能多层膜的反射特性。结果表明：制备出的双功能膜性能与设计相符, 在入射角13°, 19.5 nm处的反射率达到33.3%, 接近传统的19.5 nm周期高反膜的反射率, 并且在30.4 nm附近将反射率由1.1%降到9.6×10-4。
Abstract
A dual-functional extreme ultraviolet(EUV) multilayer(ML) mirror was designed for high-reflectivity at 19.5 nm ( Fe Ⅻ line ) and low-reflectivity at 30.4 nm ( He Ⅱ line ). The design based on genetic algorithm(GA) utilized a stack composed of two periodic multilayers: a bottom multilayer for high reflectivity at 19.5 nm, and a top multilayer for low-reflectivity at 30.4 nm. The multilayer mirror was prepared by direct current magnetron sputtering, and characterized by grazing-incident X-ray diffraction(XRD) and synchrotron radiation(SR). The experiment results show that the dual-functional multilayer achieves the reflectivity of 33.3% at 19.5 nm and 9.6×10-4 at 30.4 nm at incident angle of 13°.
蒋励, 王晓强, 谭默言, 黄秋实, 李浩川, 周斯卡, 朱京涛, 王占山. 在19.5 nm处高反在30.4 nm处抑制的双功能薄膜[J]. 强激光与粒子束, 2011, 23(5): 1299. Jiang Li, Wang Xiaoqiang, Tan Moyan, Huang Qiushi, Li Haochuan, Zhou Sika, Zhu Jingtao, Wang Zhanshan. Dual-functional multilayer for high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm[J]. High Power Laser and Particle Beams, 2011, 23(5): 1299.
PDF全文
