Highly sensitive and homogeneous SERS substrate fabricated by a femtosecond laser combined with dewetting

Xudong Tan; Lan Jiang; Jie Hu; Pengjun Liu; Andong Wang; Yong Lu

doi:doi:10.3788/COL201513.111401

Chinese Optics Letters, 2015, 13 (11): 111401, Published Online: Sep. 13, 2018

Highly sensitive and homogeneous SERS substrate fabricated by a femtosecond laser combined with dewetting Download： 811次

Xudong Tan Lan Jiang Jie Hu ^*Pengjun Liu Andong Wang Yong Lu

Author Affiliations

Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering, Beijing Institute of Technology, Beijing 100081, China

Figures & Tables

Fig. 1. Schematic fabrication process of SERS substrates.

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Fig. 2. (a) SEM image and (b) AFM profile of the surface morphology written on silicon samples. The scale bar represents 2 μm.

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Fig. 3. SEM images of NPs (a) on flat silicon surface and (c) on the ripple structure of 10 nm Au film dewetting; (b) and (d) are size distribution of NPs, respectively.

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Fig. 4. (a) SERS spectra of different processing substrate. Red: FS+NPs area with $10^{- 6}$ mol/L R6 G; Blue: FS + Film with $10^{- 6}$ mol/L R6G; Green: NPs with $10^{- 6}$ mol/L R6G; Black: fs laser-machined silicon with $10^{- 2}$ mol/L R6G. (b) Raman map image of $20 μm \times 20 μm$ areas on the SERS substrates.

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Fig. 5. SERS spectrum on fs laser-machined, gold-coated, thermal dewetting substrates coating different thicknesses of films.

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Fig. 6. EFs of SERS signal at $1361 {cm}^{- 1}$ on fs laser-machined, gold-coated, thermal dewetting substrates coating different thicknesses of gold films. (a)–(e) scale bars represent 500 nm, (f) and (g) represent 200 nm.

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Xudong Tan, Lan Jiang, Jie Hu, Pengjun Liu, Andong Wang, Yong Lu. Highly sensitive and homogeneous SERS substrate fabricated by a femtosecond laser combined with dewetting[J]. Chinese Optics Letters, 2015, 13(11): 111401.

Highly sensitive and homogeneous SERS substrate fabricated by a femtosecond laser combined with dewetting Download： 811次

Fig. 1. Schematic fabrication process of SERS substrates.

Fig. 2. (a) SEM image and (b) AFM profile of the surface morphology written on silicon samples. The scale bar represents 2 μm.

Fig. 3. SEM images of NPs (a) on flat silicon surface and (c) on the ripple structure of 10 nm Au film dewetting; (b) and (d) are size distribution of NPs, respectively.

Fig. 5. SERS spectrum on fs laser-machined, gold-coated, thermal dewetting substrates coating different thicknesses of films.

Fig. 6. EFs of SERS signal at $1361 {cm}^{- 1}$ on fs laser-machined, gold-coated, thermal dewetting substrates coating different thicknesses of gold films. (a)–(e) scale bars represent 500 nm, (f) and (g) represent 200 nm.

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Highly sensitive and homogeneous SERS substrate fabricated by a femtosecond laser combined with dewetting Download： 811次

Fig. 1. Schematic fabrication process of SERS substrates.

Fig. 2. (a) SEM image and (b) AFM profile of the surface morphology written on silicon samples. The scale bar represents 2 μm.

Fig. 3. SEM images of NPs (a) on flat silicon surface and (c) on the ripple structure of 10 nm Au film dewetting; (b) and (d) are size distribution of NPs, respectively.

Fig. 4. (a) SERS spectra of different processing substrate. Red: FS+NPs area with 10−6 mol/L R6 G; Blue: FS + Film with 10−6 mol/L R6G; Green: NPs with 10−6 mol/L R6G; Black: fs laser-machined silicon with 10−2 mol/L R6G. (b) Raman map image of 20 μm×20 μm areas on the SERS substrates.

Fig. 5. SERS spectrum on fs laser-machined, gold-coated, thermal dewetting substrates coating different thicknesses of films.

Fig. 6. EFs of SERS signal at 1361 cm−1 on fs laser-machined, gold-coated, thermal dewetting substrates coating different thicknesses of gold films. (a)–(e) scale bars represent 500 nm, (f) and (g) represent 200 nm.

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Fig. 6. EFs of SERS signal at $1361 {cm}^{- 1}$ on fs laser-machined, gold-coated, thermal dewetting substrates coating different thicknesses of gold films. (a)–(e) scale bars represent 500 nm, (f) and (g) represent 200 nm.