Low-cost method of fabricating large-aperture, high efficiency, Fresnel diffractive membrane optic using a modified moiré technique

Jian Zhang; Mengjuan Li; Ganghua Yin; Jianchao Jiao; Zhengkun Liu; Xiangdong Xu; Shaojun Fu

doi:doi:10.3788/COL201614.100501

Chinese Optics Letters, 2016, 14 (10): 100501, Published Online: Aug. 2, 2018

Low-cost method of fabricating large-aperture, high efficiency, Fresnel diffractive membrane optic using a modified moiré technique Download： 1107次

Jian Zhang ¹Mengjuan Li ²Ganghua Yin ²Jianchao Jiao ²Zhengkun Liu ^1,*Xiangdong Xu ¹Shaojun Fu ¹

Author Affiliations

¹ National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China

² Beijing Institute of Space Mechanics & Electricity, Beijing 100076, China

Figures & Tables

Fig. 1. Schematic setup of the alignment system based on the moiré phenomenon.

下载图片查看原文

Fig. 2. Analysis of two overlapped concentric-circle gratings.

下载图片查看原文

Fig. 3. Conventional moiré fringe generated by a computer (P1=2.1 μm, P2=2 μm) with an x direction misalignment of (a) 0, (b) 0.25, (c) 0.5, and (d) 1 μm.

下载图片查看原文

Fig. 4. The designed alignment mark on (a) the mask and (b) the wafer.

下载图片查看原文

Fig. 5. The designed moiré fringe generated by a computer (P1=2.1 μm, P2=2 μm) with an x direction misalignment of (a) 0, (b) 0.2, (c) 0.5, and (d) 1 μm.

下载图片查看原文

Fig. 6. Fabrication process of multi-level membrane FZLs.

下载图片查看原文

Fig. 7. A replicated four-level membrane FZL.

下载图片查看原文

Fig. 8. AFM profiles of four-level FZLs on fused silica before and after HF etching.

下载图片查看原文

Fig. 9. Diffraction efficiency of a four-level membrane FZL.

下载图片查看原文

Table1. Comparison of AE between 5 FZLs Fabricated on Fused Silica by Using Conventional Alignment Marks and Modified Alignment Marks, (p1=4.2 μm, p2=4 μm)

AE (μm)	Sample 1	Sample 2	Sample 3	Sample 4	Sample 5
Conventional Mark	0.7	0.65	0.65	0.6	0.6
Modified Mark	0.5	0.4	0.4	0.35	0.25

查看原文

Table2. Comparison of Diffraction Efficiency between 5 FZLs Fabricated on Fused Silica by Using Conventional Alignment Marks and Modified Alignment Marks, (p1=4.2 μm, p2=4 μm)

Diffraction Efficiency	Sample 1 (%)	Sample 2 (%)	Sample 3 (%)	Sample 4 (%)	Sample 5 (%)
Conventional Mark	42.5	45	45	47	48
Modified Mark	54	55	58	61.5	66.6

查看原文

Jian Zhang, Mengjuan Li, Ganghua Yin, Jianchao Jiao, Zhengkun Liu, Xiangdong Xu, Shaojun Fu. Low-cost method of fabricating large-aperture, high efficiency, Fresnel diffractive membrane optic using a modified moiré technique[J]. Chinese Optics Letters, 2016, 14(10): 100501.

Low-cost method of fabricating large-aperture, high efficiency, Fresnel diffractive membrane optic using a modified moiré technique Download： 1107次

Fig. 1. Schematic setup of the alignment system based on the moiré phenomenon.

Fig. 2. Analysis of two overlapped concentric-circle gratings.

Fig. 3. Conventional moiré fringe generated by a computer (P1=2.1 μm, P2=2 μm) with an x direction misalignment of (a) 0, (b) 0.25, (c) 0.5, and (d) 1 μm.

Fig. 4. The designed alignment mark on (a) the mask and (b) the wafer.

Fig. 5. The designed moiré fringe generated by a computer (P1=2.1 μm, P2=2 μm) with an x direction misalignment of (a) 0, (b) 0.2, (c) 0.5, and (d) 1 μm.

Fig. 6. Fabrication process of multi-level membrane FZLs.

Fig. 7. A replicated four-level membrane FZL.

Fig. 8. AFM profiles of four-level FZLs on fused silica before and after HF etching.

Fig. 9. Diffraction efficiency of a four-level membrane FZL.

Table1. Comparison of AE between 5 FZLs Fabricated on Fused Silica by Using Conventional Alignment Marks and Modified Alignment Marks, (p1=4.2 μm, p2=4 μm)

Table2. Comparison of Diffraction Efficiency between 5 FZLs Fabricated on Fused Silica by Using Conventional Alignment Marks and Modified Alignment Marks, (p1=4.2 μm, p2=4 μm)

关于本站 Cookie 的使用提示

全站搜索

Low-cost method of fabricating large-aperture, high efficiency, Fresnel diffractive membrane optic using a modified moiré technique Download： 1107次

Fig. 1. Schematic setup of the alignment system based on the moiré phenomenon.

Fig. 2. Analysis of two overlapped concentric-circle gratings.

Fig. 3. Conventional moiré fringe generated by a computer (P1=2.1 μm, P2=2 μm) with an x direction misalignment of (a) 0, (b) 0.25, (c) 0.5, and (d) 1 μm.

Fig. 4. The designed alignment mark on (a) the mask and (b) the wafer.

Fig. 5. The designed moiré fringe generated by a computer (P1=2.1 μm, P2=2 μm) with an x direction misalignment of (a) 0, (b) 0.2, (c) 0.5, and (d) 1 μm.

Fig. 6. Fabrication process of multi-level membrane FZLs.

Fig. 7. A replicated four-level membrane FZL.

Fig. 8. AFM profiles of four-level FZLs on fused silica before and after HF etching.

Fig. 9. Diffraction efficiency of a four-level membrane FZL.

Table1. Comparison of AE between 5 FZLs Fabricated on Fused Silica by Using Conventional Alignment Marks and Modified Alignment Marks, (p1=4.2 μm, p2=4 μm)

Table2. Comparison of Diffraction Efficiency between 5 FZLs Fabricated on Fused Silica by Using Conventional Alignment Marks and Modified Alignment Marks, (p1=4.2 μm, p2=4 μm)

相关论文

相关资讯

关于本站 Cookie 的使用提示

全站搜索